SCHEMBL3482078

SCHEMBL3482078

COc1ccc([Si](C)(C)OC)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.55
CA2 P00918 2/20 0.55
CA7 P43166 2/20 0.55
CA9 Q16790 2/20 0.55
CA12 O43570 1/20 0.55
CA14 Q9ULX7 1/20 0.55
ACHE P22303 1/20 0.46
ALDH1A1 P00352 3/20 0.44
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
TDP1 Q9NUW8 3/20 0.44
MAPK1 P28482 2/20 0.44
NPC1 O15118 3/20 0.42
RAB9A P51151 3/20 0.42
KDM4E B2RXH2 1/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
THRB P10828 1/20 0.42
RECQL P46063 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6749525 0.88 CA1 (0.42) CA1CA2CA7CA9CA12
SCHEMBL676007 0.87 CA12 (0.30) CA1CA2CA7CA9CA12
SCHEMBL6751468 0.83 KDM4E (0.45) CA1CA2CA7CA9CA12
SCHEMBL3473631 0.80 CA1 (0.55) CA1CA2CA7CA9CA12
SCHEMBL19862402 0.79 CA1 (0.61) CA1CA2CA7CA9CA12
SCHEMBL21870376 0.79 ESR1 (0.41) ESR2
SCHEMBL275937 0.79 CA1 (0.61) CA1CA2CA7CA9CA12
SCHEMBL12977035 0.79 NR1H2 (0.38) ACHE
SCHEMBL21096087 0.79 ESR2 (0.32) KDM4EESR2
SCHEMBL3482283 0.78 CA1 (0.46) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
CN-101641767-B Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device FUJITSU LTD 2013-10-30 CN disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20050234255-A1 Electrochemical method for the production of organofunctional silanes Consortium für elektrochemische Industrie GmbH (DE) 2005-10-20 US disclosed
EP-1507898-A1 ELECTROCHEMICAL METHOD FOR THE PRODUCTION OF ORGANOFUNCTIONAL SILANES Consortium für elektrochemische Industrie GmbH (DE) 2005-02-23 EP disclosed
WO-2003100134-A1 ELECTROCHEMICAL METHOD FOR THE PRODUCTION OF ORGANOFUNCTIONAL SILANES Consortium für elektrochemische Industrie GmbH (DE) 2003-12-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050234255-A1 Electrochemical method for the production of organofunctional silanes CYP4F2, CYP4F3, CYP4F11 CA1 103/4885CA2 404/4885CA7 357/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.