SCHEMBL3482623

SCHEMBL3482623

C=C[Si](C)(O)[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28207225 0.80
SCHEMBL59125 0.75
SCHEMBL28020349 0.75
SCHEMBL202734 0.75
SCHEMBL3481980 0.72
SCHEMBL464998 0.72
Lithium SCHEMBL31437130 0.72
SCHEMBL8079689 0.72
Potassium SCHEMBL31135317 0.72
SCHEMBL27965016 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1235877-B1 THERMOPLASTIC SILICONE ELASTOMERS BASED ON FLUOROCARBON RESIN DOW CORNING (US) 2005-03-23 EP claimed
EP-1235877-A1 THERMOPLASTIC SILICONE ELASTOMERS BASED ON FLUOROCARBON RESIN DOW CORNING CORPORATION (US) 2002-09-04 EP claimed
WO-2001019914-A1 THERMOPLASTIC SILICONE ELASTOMERS BASED ON FLUOROCARBON RESIN DOW CORNING CORPORATION (US) 2001-03-22 WO claimed
US-6015858-A CURING; TENSILE STRENGTH, ELONGATION DOW CORNING CORPORATION (US) 2000-01-18 US claimed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-7718727-B2 Fluoroplastic silicone vulcanizates DOW CORNING CORPORATION (US) 2010-05-18 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20090286935-A1 FLUOROCARBON ELASTOMER SILICONE VULCANIZATES DOW CORNING CORPORATION 2009-11-19 US disclosed
EP-1641878-B1 FLUOROPLASTIC SILICONE VULCANIZATES DOW CORNING (US) 2009-11-18 EP disclosed
US-20090215959-A1 FLUOROPLASTIC SILICONE VULCANIZATES HARTMANN MARK 2009-08-27 US disclosed
EP-1511806-A1 FLUOROCARBON ELASTOMER SILICONE VULCANIZATES Dow Corning Corporation (US) 2005-03-09 EP disclosed
EP-1509570-A1 FLUOROCARBON ELASTOMER SILICONE VULCANIZATES Dow Corning Corporation (US) 2005-03-02 EP disclosed
WO-2004108822-A1 FLUOROPLASTIC SILICONE VULCANIZATES DOW CORNING CORPORATION (US) 2004-12-16 WO disclosed
WO-2003104322-A1 FLUOROCARBON ELASTOMER SILICONE VULCANIZATES DOW CORNING CORPORATION (US) 2003-12-18 WO disclosed
WO-2003104323-A1 FLUOROCARBON ELASTOMER SILICONE VULCANIZATES DOW CORNING CORPORATION (US) 2003-12-18 WO disclosed
EP-1235877-A1 THERMOPLASTIC SILICONE ELASTOMERS BASED ON FLUOROCARBON RESIN DOW CORNING CORPORATION (US) 2002-09-04 EP disclosed
WO-2001019914-A1 THERMOPLASTIC SILICONE ELASTOMERS BASED ON FLUOROCARBON RESIN DOW CORNING CORPORATION (US) 2001-03-22 WO disclosed
US-6015858-A CURING; TENSILE STRENGTH, ELONGATION DOW CORNING CORPORATION (US) 2000-01-18 US disclosed