SCHEMBL3482677

SCHEMBL3482677

C=CC(C=C)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21313677 0.70
SCHEMBL8854413 0.69
SCHEMBL253509 0.67
SCHEMBL11562443 0.67
SCHEMBL395568 0.65
SCHEMBL8849360 0.65
SCHEMBL5955422 0.65
SCHEMBL1362542 0.65
SCHEMBL21313676 0.64
SCHEMBL28086076 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107922561-B Polyurethane resin particles 关西涂料株式会社 2024-07-12 CN disclosed
CN-118063768-A Near infrared siloxane-based quinoline polymer, preparation method thereof and application thereof in detection of copper ions 齐鲁理工学院 2024-05-24 CN disclosed
WO-2022190464-A1 ACRYLIC RESIN-MODIFIED SILICA PARTICLES, COATING COMPOSITION AND METHOD FOR FORMING MULTILAYER COATING FILM 関西ペイント株式会社 2022-09-15 WO disclosed
EP-3572473-B1 AQUEOUS COATING COMPOSITION AND METHOD FOR FORMING MULTILAYERED COATING FILM KANSAI PAINT CO LTD (JP) 2022-07-06 EP disclosed
US-11021631-B2 Aqueous coating composition KANSAI PAINT CO., LTD. (JP) 2021-06-01 US disclosed
CN-108884360-B Aqueous coating composition 关西涂料株式会社 2021-04-16 CN disclosed
EP-3428240-B1 WATER-BASED COATING COMPOSITION KANSAI PAINT CO LTD (JP) 2020-10-28 EP disclosed
US-10669446-B2 Water-based coating composition KANSAI PAINT CO., LTD. (JP) 2020-06-02 US disclosed
CN-108713046-B Aqueous coating composition 关西涂料株式会社 2020-05-22 CN disclosed
US-10619072-B2 Urethane resin particles KANSAI PAINT CO., LTD. (JP) 2020-04-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20090099298-A1 Water-based paint compositions KANSAI PAINT CO., LTD. 2009-04-16 US disclosed
US-6150441-A A ONE-PACK SEALANT COMPRISING AN ADDITION POLYMER, A CURING AGENT HAVING AT LEAST TWO HYDROSILYL GROUPS IN ITS MOLECULE, A HYDROSILYLATION CATALYST AND A TACKIFIER; BINDING GLASS PLATES KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2000-11-21 US disclosed
EP-0989168-A1 Water-based coating composition Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
US-5998561-A USING PLATIMUM, PALLADIUM COMPLEX CATALYST JENERIC/PENTRON INCORPORATED (US) 1999-12-07 US disclosed
WO-1998040043-A1 CATALYST AND COMPOSITION FOR SILICONE DENTAL IMPRESSION MATERIALS JENERIC/PENTRON INCORPORATED (US) 1998-09-17 WO disclosed
EP-0803483-A1 COMPOSITION FOR DOUBLE-GLAZING UNIT KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1997-10-29 EP disclosed
EP-0279456-B1 Process for producing isobutylene polymers having functional terminal end groups KANEGAFUCHI CHEMICAL IND (JP) 1995-05-03 EP disclosed
US-4870144-A INITIATOR AND CHAIN TRANSFER AGENT KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1989-09-26 US disclosed
EP-0279456-A2 Process for producing isobutylene polymers having functional terminal end groups KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-08-24 EP disclosed