⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29090343 | 0.97 | TSHR (0.45) | — | |
| SCHEMBL29090344 | 0.97 | TSHR (0.45) | — | |
| SCHEMBL5137628 | 0.90 | — | — | |
| SCHEMBL29369300 | 0.87 | EPHX1 (0.55) | — | |
| SCHEMBL11096156 | 0.87 | — | — | |
| SCHEMBL29369770 | 0.87 | EPHX1 (0.55) | — | |
| SCHEMBL1061555 | 0.87 | EPHX1 (0.55) | — | |
| SCHEMBL4075579 | 0.87 | — | — | |
| SCHEMBL18991339 | 0.87 | EPHX1 (0.55) | — | |
| SCHEMBL18991355 | 0.87 | EPHX1 (0.55) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 671 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035783-A1 | SIN FILM EMBEDDING METHOD AND FILM FORMATION APPARATUS | TOKYO ELECTRON LTD (JP) | 2026-02-05 | — | — | US | claimed |
| US-20250226177-A1 | FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING | TOKYO ELECTRON LIMITED (JP) | 2025-07-10 | — | — | US | claimed |
| US-12344933-B2 | SiN film embedding method | TOKYO ELECTRON LIMITED (JP) | 2025-07-01 | — | — | US | claimed |
| US-12288671-B2 | Film deposition apparatus for fine pattern forming | TOKYO ELECTRON LIMITED (JP) | 2025-04-29 | — | — | US | claimed |
| WO-2025027254-A1 | THERMOSETTING COMPOSITE RESINS REPAIRABLE UNDER OSCILLATING MAGNETIC STIMULUS, FOR INSULATING POWER MODULES | SAFRAN (FR) | 2025-02-06 | — | — | WO | claimed |
| EP-2888385-B2 | COATED STEEL STRIP OR SHEET HAVING ADVANTAGEOUS PROPERTIES | TATA STEEL IJMUIDEN BV (NL) | 2024-11-13 | — | — | EP | claimed |
| CN-118213269-A | Semiconductor device and method for manufacturing the same | 铠侠股份有限公司 | 2024-06-18 | — | — | CN | claimed |
| US-20240096595-A1 | FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING | TOKYO ELECTRON LIMITED (JP) | 2024-03-21 | — | — | US | claimed |
| US-11881379-B2 | Film deposition apparatus for fine pattern forming | TOKYO ELECTRON LIMITED (JP) | 2024-01-23 | — | — | US | claimed |
| EP-4288579-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | Versum Materials US, LLC (US) | 2023-12-13 | — | — | EP | claimed |
| US-20060278952-A1 | Semiconductor device and fabrication process thereof | FUJITSU LIMITED (JP) | 2006-12-14 | — | — | US | claimed |
| US-7037803-B2 | Manufacture of semiconductor device having STI and semiconductor device manufactured | FUJITSU LIMITED (JP) | 2006-05-02 | — | — | US | claimed |
| CN-1243044-C | Soakage reversibly variable temperature-responsive copolymer film preparation method | CHINESE ACAD INST CHEMISTRY (CN) | 2006-02-22 | — | — | CN | claimed |
| CN-1569933-A | Soakage reversibly variable temperature-responsive copolymer film preparation method | CHINESE ACAD INST CHEMISTRY (CN) | 2005-01-26 | — | — | CN | claimed |
| US-20040115897-A1 | Manufacture of semiconductor device having STI and semiconductor device manufactured | FUJITSU LIMITED (JP) | 2004-06-17 | — | — | US | claimed |
| EP-1040165-B1 | A POLYSILOXANE HAVING A COPOLYMER DISPERSED THEREIN AND SEALANTS CONTAINING THE SAME | TREMCO INC (US) | 2002-06-12 | — | — | EP | claimed |
| US-6403711-B1 | BINDER IN CAULKS AND SEALANTS; ADDITION FREE RADICALLY POLYMERIZING LOW AND HIGH TG POLYMER-FORMING MONOMERS IN THE PRESENCE OF POLYSILOXANE | NOVEON IP HOLDINGS CORP. | 2002-06-11 | — | — | US | claimed |
| JP-2002508426-A | — | — | 2002-03-19 | — | — | JP | claimed |
| EP-1040165-A1 | A POLYSILOXANE HAVING A COPOLYMER DISPERSED THEREIN AND SEALANTS CONTAINING THE SAME | The B.F. Goodrich Company (US) | 2000-10-04 | — | — | EP | claimed |
| WO-1999031179-A1 | A POLYSILOXANE HAVING A COPOLYMER DISPERSED THEREIN AND SEALANTS CONTAINING THE SAME | THE B.F. GOODRICH COMPANY (US) | 1999-06-24 | — | — | WO | claimed |