SCHEMBL3495459

SCHEMBL3495459

[CH2]OCC(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10950876 0.78
SCHEMBL65799 0.73
SCHEMBL5146958 0.73 TDP1 (0.32)
SCHEMBL2666906 0.73
SCHEMBL2343330 0.73 PIK3CD (0.31)
SCHEMBL7875855 0.73
Water SCHEMBL6480646 0.71
SCHEMBL7431682 0.71
SCHEMBL30233554 0.71
SCHEMBL1511742 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4225706-A Polychalcogen ester of cephem compound, process for preparing the same and method for removing the protective group of the same MEIJI SEIKA KAISHA LTD. (JP) 1980-09-30 US claimed
US-8759362-B2 Bicycloheteroaryl compounds and their use as TRPV1 ligands PURDUE PHARMA L.P. (US) 2014-06-24 US disclosed
US-20100130499-A1 BICYCLOHETEROARYL COMPOUNDS AND THEIR USE AS TRPV1 LIGANDS PURDUE PHARMA L.P. 2010-05-27 US disclosed
US-7432034-B2 Negative resist composition FUJIFILM CORPORATION (JP) 2008-10-07 US disclosed
US-20060262367-A1 Authentication recording medium and medium and authentication recording medium producting method KONICA MINOLTA PHOTO IMAGING, INC. (JP) 2006-11-23 US disclosed
US-20060073312-A1 Authentication/identification card KONICA MINOLTA PHOTO IMAGING, INC. (JP) 2006-04-06 US disclosed
EP-1072955-B1 Image forming material FUJI PHOTO FILM CO LTD (JP) 2006-03-01 EP disclosed
EP-1547806-A1 AUTHENTICATION/IDENTIFICATION CARD Konica Minolta Photo Imaging, Inc. (JP) 2005-06-29 EP disclosed
US-6900767-B2 IC card KONICA CORPORATION (JP) 2005-05-31 US disclosed
US-20040033441-A1 Negative resist composition FUJI PHOTO FILM CO., LTD. 2004-02-19 US disclosed
US-6068963-A CONTAINS (A) A POLYMER HAVING A HETEROCYCLIC GROUP CONTAINING AN UNSATURATED BOND THEREIN, (B) A CROSS-LINKING AGENT THAT CROSS-LINKS WITH THE AID OF AN ACID, AND (C) A COMPOUND THAT GENERATES AN ACID UPON EXPOSURE TO LIGHT OR HEAT. FUJI PHOTO FILM CO., LTD. (JP) 2000-05-30 US disclosed
EP-0823659-B1 Negative type image recording material FUJI PHOTO FILM CO LTD (JP) 1999-12-01 EP disclosed
US-5948590-A CAPABLE OF PROCESSING DIRECTLY FROM COMPUTER AND OTHER DIGITAL DATA, WITH EXCELLENT PRINTING DURABILITY AT THE TIME OF PRINTING AND LACK OF STAINING. POLYMER, CURING AGENT, COMPOUND WHICH GENERATES AN ACID IN PRESENCE OF HEAT OR LIGHT. FUJI PHOTO FILM CO., LTD. (JP) 1999-09-07 US disclosed
EP-0854388-A2 Negative-type image recording materials FUJI PHOTO FILM CO., LTD. (JP) 1998-07-22 EP disclosed
EP-0823659-A1 Negative type image recording material FUJI PHOTO FILM CO., LTD. (JP) 1998-02-11 EP disclosed
US-5646171-A HYPOTENSIVE AGENTS SANKYO COMPANY, LIMITED (JP) 1997-07-08 US disclosed
US-5616599-A HYPOTENSIVE AGENTS FOR CARDIOVASCULAR DISORDER SANKYO COMPANY, LIMITED (JP) 1997-04-01 US disclosed
EP-0545912-A2 1-Biphenylmethylimidazole derivatives, their preparation and their therapeutic use Sankyo Company Limited (JP) 1993-06-09 EP disclosed
EP-0503785-A1 1-Biphenylimidazole derivatives, their preparation and their therapeutic use Sankyo Company Limited (JP) 1992-09-16 EP disclosed
US-4225706-A Polychalcogen ester of cephem compound, process for preparing the same and method for removing the protective group of the same MEIJI SEIKA KAISHA LTD. (JP) 1980-09-30 US disclosed