SCHEMBL3501010

SCHEMBL3501010

CCC1=COC1CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15314042 0.63
SCHEMBL13570129 0.56
SCHEMBL2380263 0.53
SCHEMBL10000973 0.51
SCHEMBL19337930 0.51
SCHEMBL10746016 0.48
Alcohol SCHEMBL2021650 0.46
Alcohol SCHEMBL6910520 0.45 TSHR (1.00)
Alcohol SCHEMBL9461084 0.45 TSHR (1.00)
Alcohol SCHEMBL54946 0.45

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2118169-B2 CURABLE COMPOSITION 3D SYSTEMS INC (US) 2021-03-17 EP disclosed
US-8362148-B2 For stereolithography, rapid prototyping and tooling; improved impact strength; methyl methacrylate block polymer as impact modifier, photoinitiator, and monomers and oligomers polymerizable by a ring-opening reaction 3D SYSTEMS, INC. (US) 2013-01-29 US disclosed
EP-2118169-B1 CURABLE COMPOSITION 3D SYSTEMS INC (US) 2012-07-18 EP disclosed
US-20100104832-A1 CURABLE COMPOSITION 3D SYSTEMS, INC. 2010-04-29 US disclosed
EP-2118169-A1 CURABLE COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2009-11-18 EP disclosed
WO-2008110564-A1 CURABLE COMPOSITION HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2008-09-18 WO disclosed