SCHEMBL350970

SCHEMBL350970

NCCNCC(N)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11549656 0.94 CA12 (0.61)
SCHEMBL20242588 0.88
SCHEMBL28394481 0.86 CA12 (0.57)
Ammonia Solution, Strong SCHEMBL2298498 0.86 CA12 (0.52)
SCHEMBL4826284 0.80 ANPEP (0.37)
SCHEMBL16697214 0.77 CA12 (0.47)
SCHEMBL2336707 0.77
SCHEMBL3982804 0.77
SCHEMBL4477562 0.77
SCHEMBL2990274 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116180083-B Etching liquid for MTD-Cu-MTD of liquid crystal display panel and preparation method thereof 江苏和达电子科技有限公司 2024-12-03 CN claimed
CN-116180083-A Etching liquid for MTD-Cu-MTD of liquid crystal display panel and preparation method thereof 江苏和达电子科技有限公司 2023-05-30 CN claimed
CN-110923713-A Etching liquid for copper-molybdenum and alloy films and preparation method thereof 成都中电熊猫显示科技有限公司 2020-03-27 CN claimed
CN-116180083-B Etching liquid for MTD-Cu-MTD of liquid crystal display panel and preparation method thereof 江苏和达电子科技有限公司 2024-12-03 CN disclosed
CN-116180083-A Etching liquid for MTD-Cu-MTD of liquid crystal display panel and preparation method thereof 江苏和达电子科技有限公司 2023-05-30 CN disclosed
CN-110923713-B Etching liquid for copper-molybdenum and alloy films and preparation method thereof 成都中电熊猫显示科技有限公司 2020-12-08 CN disclosed
CN-110923713-A Etching liquid for copper-molybdenum and alloy films and preparation method thereof 成都中电熊猫显示科技有限公司 2020-03-27 CN disclosed
US-9433827-B2 Golf equipment formed from castable formulation with unconventionally low hardness and increased shear resistance ACUSHNET COMPANY (US) 2016-09-06 US disclosed
US-20150072807-A1 GOLF EQUIPMENT FORMED FROM CASTABLE FORMULATION WITH UNCONVENTIONALLY LOW HARDNESS AND INCREASED SHEAR RESISTANCE ACUSHNET COMPANY (US) 2015-03-12 US disclosed
US-8907040-B2 Golf equipment formed from castable formulation with unconventionally low hardness and increased shear resistance ACUSHNET COMPANY (US) 2014-12-09 US disclosed
US-8674051-B2 Polyurea and polyurethane compositions for golf equipment ACUSHNET COMPANY (US) 2014-03-18 US disclosed
US-20040220356-A1 Compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-11-04 US disclosed
US-20040220377-A1 Compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-11-04 US disclosed
US-20040220378-A1 Compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-11-04 US disclosed
US-20040220376-A1 Compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-11-04 US disclosed
US-20040220373-A1 Compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-11-04 US disclosed
US-20040220357-A1 Compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-11-04 US disclosed
US-20040209708-A1 Water resistant polyurea elastomers for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2004-10-21 US disclosed
US-20030220464-A1 Polyurea and polyurethane compositions for golf equipment JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2003-11-27 US disclosed
US-20030212240-A1 Polyurethane compositions for golf balls JPMORGAN CHASE BANK, N.A., AS SUCCESSOR ADMINISTRATIVE AGENT 2003-11-13 US disclosed