Methoxymethane

Methoxymethane

SCHEMBL351178

CCC(=O)OCC(C)O.COC

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.55
NAAA Q02083 1/20 0.39
HSD17B10 Q99714 1/20 0.38
ALDH1A1 P00352 2/20 0.35
CYP1A2 P05177 1/20 0.35
HPGD P15428 1/20 0.35
CYP2C19 P33261 1/20 0.35
BLM P54132 1/20 0.35
WRN Q14191 1/20 0.35
HIF1A Q16665 1/20 0.35
LMNA P02545 2/20 0.35
KDM4E B2RXH2 1/20 0.35
DUSP3 P51452 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
MAPK1 P28482 1/20 0.34
TSHR P16473 3/20 0.34
TDP1 Q9NUW8 2/20 0.32
CYP3A4 P08684 1/20 0.32
ATM Q13315 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL444679 0.95
Ammonia Solution, Strong SCHEMBL28764799 0.93 MAPT (0.57) MAPTNAAAHSD17B10ALDH1A1CYP1A2
SCHEMBL7662137 0.91 MAPT (0.52) MAPTNAAAHSD17B10ALDH1A1CYP1A2
Ether SCHEMBL3291423 0.87 MAPT (0.52) MAPTNAAAHSD17B10ALDH1A1CYP1A2
Methoxymethane SCHEMBL19666597 0.86 TDP1 (0.47) MAPTNAAAHSD17B10ALDH1A1CYP1A2
SCHEMBL3094107 0.84 HSD17B10 (0.57) MAPTNAAAHSD17B10ALDH1A1CYP1A2
Methoxymethane SCHEMBL19666686 0.83 MAPT (0.67) MAPTHSD17B10ALDH1A1LMNAKDM4E
SCHEMBL1464838 0.81 TDP1 (0.50) MAPTNAAAHSD17B10ALDH1A1CYP1A2
SCHEMBL3284798 0.81 MAPT (0.59) MAPTNAAAHSD17B10ALDH1A1HPGD
SCHEMBL30791465 0.81 MAPT (0.46) MAPTNAAAHSD17B10CYP1A2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12216403-B2 Positive photosensitive resin composition and display device using the same DONJIN SEMICHEM CO., LTD. (KR) 2025-02-04 US claimed
US-20240118616-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2024-04-11 US claimed
EP-2781637-B1 NONWOVEN FABRIC FORMED FROM FIBER COATED WITH ORGANIC BINDER POLYMER COMPOUND, ELECTROCHEMICAL DEVICE COMPRISING NONWOVEN FABRIC, AND METHOD FOR MANUFACTURING NONWOVEN FABRIC LG ENERGY SOLUTION LTD (KR) 2024-02-21 EP claimed
CN-116068853-A Photosensitive resin composition and display device 三星显示有限公司 2023-05-05 CN claimed
CN-116057089-A Low refractive thermosetting composition, optical member and display device using the same 株式会社东进世美肯 2023-05-02 CN claimed
US-10316236-B2 Paste composition, heating element, heating apparatus, and method of manufacturing the paste composition SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-06-11 US claimed
US-10153469-B2 Non-woven fabric made from fiber coated with organic binder polymer compound, electrochemical cell comprising the non-woven fabric, and method for making the non-woven fabric LG CHEM, LTD. (KR) 2018-12-11 US claimed
US-20170158935-A1 PASTE COMPOSITION, HEATING ELEMENT, HEATING APPARATUS, AND METHOD OF MANUFACTURING THE PASTE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-06-08 US claimed
US-9133353-B2 Low temperature curable polyimide resin and method of preparing the same LG CHEM, LTD. (KR) 2015-09-15 US claimed
EP-2781637-A1 NONWOVEN FABRIC FORMED FROM FIBER COATED WITH ORGANIC BINDER POLYMER COMPOUND, ELECTROCHEMICAL DEVICE COMPRISING NONWOVEN FABRIC, AND METHOD FOR MANUFACTURING NONWOVEN FABRIC LG Chem, Ltd. (KR) 2014-09-24 EP claimed
US-20140272525-A1 NON-WOVEN FABRIC MADE FROM FIBER COATED WITH ORGANIC BINDER POLYMER COMPOUND, ELECTROCHEMICAL CELL COMPRISING THE NON-WOVEN FABRIC, AND METHOD FOR MAKING THE NON-WOVEN FABRIC LG CHEM, LTD. (KR) 2014-09-18 US claimed
WO-2012033303-A2 ZNO-BASED GLASS FRIT COMPOSITION AND ALUMINUM PASTE COMPOSITION FOR BACK CONTACTS OF SOLAR CELL USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2012-03-15 WO claimed
US-20120016076-A1 LOW TEMPERATURE CURABLE POLYIMIDE RESIN AND METHOD OF PREPARING THE SAME LG CHEM. LTD. (KR) 2012-01-19 US claimed
US-20110151379-A1 BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES LG CHEM, LTD. (KR) 2011-06-23 US claimed
US-12366805-B2 Chemical liquid, rinsing solution, and resist pattern forming method FUJIFILM CORPORATION (JP) 2025-07-22 US disclosed
US-12216403-B2 Positive photosensitive resin composition and display device using the same DONJIN SEMICHEM CO., LTD. (KR) 2025-02-04 US disclosed
US-12210287-B2 Resist pattern forming method and semiconductor chip manufacturing method FUJIFILM CORPORATION (JP) 2025-01-28 US disclosed
US-5672459-A PHOTORESISTS, INTEGRATED CIRCUITS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-30 US disclosed
EP-0786699-A1 Positive photoresist composition Fuji Photo Film Co., Ltd. (JP) 1997-07-30 EP disclosed
EP-0735423-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-10-02 EP disclosed