⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1392664 | 0.93 | — | — | |
| Ethylene SCHEMBL4340400 | 0.62 | — | — | |
| Hydroxyl Radical SCHEMBL8399503 | 0.60 | — | — | |
| Hydroxyl Radical SCHEMBL1801144 | 0.57 | — | — | |
| SCHEMBL12870029 | 0.57 | — | — | |
| Hydroxyl Radical SCHEMBL4416166 | 0.57 | — | — | |
| SCHEMBL319527 | 0.57 | — | — | |
| Ammonia Solution, Strong SCHEMBL4604413 | 0.51 | — | — | |
| SCHEMBL251075 | 0.51 | — | — | |
| Hydrogen Peroxide SCHEMBL9691732 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100273330-A1 | RINSE FORMULATION FOR USE IN THE MANUFACTURE OF AN INTEGRATED CIRCUIT | CITIBANK N.A. AS COLLATERAL AGENT (NY) | 2010-10-28 | — | — | US | claimed |
| WO-2008023214-A1 | RINSE FORMULATION FOR USE IN THE MANUFACTURE OF AN INTEGRATED CIRCUIT | FREESCALE SEMICONDUCTOR, INC. (GB) | 2008-02-28 | — | — | WO | claimed |
| US-20100273330-A1 | RINSE FORMULATION FOR USE IN THE MANUFACTURE OF AN INTEGRATED CIRCUIT | CITIBANK N.A. AS COLLATERAL AGENT (NY) | 2010-10-28 | — | — | US | disclosed |
| WO-2008023214-A1 | RINSE FORMULATION FOR USE IN THE MANUFACTURE OF AN INTEGRATED CIRCUIT | FREESCALE SEMICONDUCTOR, INC. (GB) | 2008-02-28 | — | — | WO | disclosed |