Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 5/20 | 0.69 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.62 |
| ▸ | MAPT | P10636 | 5/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.61 |
| ▸ | MEN1 | O00255 | 4/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.61 |
| ▸ | LMNA | P02545 | 3/20 | 0.61 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.56 |
| ▸ | F3 | P13726 | 2/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.56 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.55 |
| ▸ | BCHE | P06276 | 1/20 | 0.55 |
| ▸ | ACHE | P22303 | 1/20 | 0.55 |
| ▸ | EGFR | P00533 | 1/20 | 0.53 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.53 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.53 |
| ▸ | HPGD | P15428 | 3/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.52 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | NPC1 | O15118 | 2/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL352161 | 1.00 | CYP1A2 (0.69) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL2847156 | 0.93 | CYP1A2 (0.58) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL51252 | 0.93 | CYP1A2 (0.58) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL29099922 | 0.93 | CYP1A2 (0.58) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL51253 | 0.93 | CYP1A2 (0.58) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL5691073 | 0.89 | MAPT (0.65) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL2387710 | 0.89 | MAPT (0.65) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL5953483 | 0.89 | CYP1A2 (0.58) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL5953479 | 0.89 | CYP1A2 (0.58) | CYP1A2FGFR1MAPTALDH1A1MEN1 | |
| SCHEMBL10980442 | 0.88 | CYP1A2 (0.65) | CYP1A2FGFR1MAPTALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 484 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119490653-A | Photosensitive polyesteramide, preparation method, composition, polyimide film and application thereof | 深圳职业技术大学 | 2025-02-21 | — | — | CN | claimed |
| CN-117384378-A | Photosensitive polyamic acid ester resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-12 | — | — | CN | claimed |
| CN-115160569-B | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-12-27 | — | — | CN | claimed |
| CN-115160569-A | Photosensitive polyamic acid ester resin, resin composition and electronic component | 明士(北京)新材料开发有限公司 | 2022-10-11 | — | — | CN | claimed |
| US-9733563-B2 | Photosensitive resin composition and photosensitive material comprising the same | LG CHEM, LTD. (KR) | 2017-08-15 | — | — | US | claimed |
| US-8399176-B2 | Photosensitive resin composition | LG CHEM, LTD. (KR) | 2013-03-19 | — | — | US | claimed |
| US-20100216073-A1 | PHOTOSENSITIVE RESIN COMPOSITION | LG CHEM, LTD. (KR) | 2010-08-26 | — | — | US | claimed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | claimed |
| US-4415621-A | COATING A SUBSTRATE WITH AN AMORPHOUS BINDER AND DYE; TELEVISION; DISCS; ABSORPTION | EASTMAN KODAK COMPANY (US) | 1983-11-15 | — | — | US | claimed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | claimed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100338-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING CURED RELIEF PATTERN | 旭化成株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-0125140-A2 | Improvements in or relating to radiation sensitive plates | VICKERS PLC (GB) | 1984-11-14 | — | — | EP | disclosed |
| EP-0118881-A2 | Binder-mixtures for optical recording layers and elements | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1984-09-19 | — | — | EP | disclosed |
| US-4415621-A | COATING A SUBSTRATE WITH AN AMORPHOUS BINDER AND DYE; TELEVISION; DISCS; ABSORPTION | EASTMAN KODAK COMPANY (US) | 1983-11-15 | — | — | US | disclosed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | disclosed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | CYP1A2 4765/4885FGFR1 2163/4885MAPT 2839/4885 |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | CYP1A2 3362/4885FGFR1 3821/4885MAPT 1027/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.