SCHEMBL3523959

SCHEMBL3523959

CCC1(CO)COC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14039901 0.77
SCHEMBL9839334 0.77 GAA (0.39)
SCHEMBL14039973 0.76
SCHEMBL18810427 0.75
SCHEMBL9788187 0.74 EPHX1 (0.30)
SCHEMBL8458859 0.71 EPHX1 (0.34)
SCHEMBL8161013 0.69
SCHEMBL27984235 0.69
SCHEMBL3528307 0.67
SCHEMBL13104982 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7659413-B2 (Meth) acryloyl group-containing oxetane compound and production method thereof SHOWA DENKO K.K. (JP) 2010-02-09 US disclosed
EP-1713787-B1 (METH) ACRYLOYL GROUP-CONTAINING OXETANE COMPOUND AND PRODUCTION METHOD THEREOF SHOWA DENKO KK (JP) 2009-12-30 EP disclosed
US-20070060760-A1 (Meth) acryloyl group-containing oxetane compound and production method thereof SHOWA DENKO K.K. (JP) 2007-03-15 US disclosed
EP-1713787-A2 (METH) ACRYLOYL GROUP-CONTAINING OXETANE COMPOUND AND PRODUCTION METHOD THEREOF SHOWA DENKO KABUSHIKI KAISHA (JP) 2006-10-25 EP disclosed
WO-2005075445-A2 (METH) ACRYLOYL GROUP-CONTAINING OXETANE COMPOUND AND PRODUCTION METHOD THEREOF SHOWA DENKO K.K. (JP) 2005-08-18 WO disclosed