SCHEMBL352699

SCHEMBL352699

C=CCOCOC(=O)C(=C)CCCCCCC

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.55
FAAH O00519 3/20 0.41
DGKA P23743 1/20 0.39
CES2 O00748 3/20 0.36
CES1 P23141 3/20 0.36
PAM P19021 2/20 0.36
PPARG P37231 4/20 0.35
PPARD Q03181 4/20 0.35
PPARA Q07869 4/20 0.35
GPR84 Q9NQS5 3/20 0.35
HDAC11 Q96DB2 3/20 0.35
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 2/20 0.35
SLC22A6 Q4U2R8 1/20 0.35
SLC22A8 Q8TCC7 1/20 0.35
TLR2 O60603 1/20 0.35
MEN1 O00255 1/20 0.35
ESR1 P03372 1/20 0.35
FABP4 P15090 1/20 0.35
ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL350717 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL352592 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL352394 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL352224 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL353116 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL351339 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL350681 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL352230 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL351981 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1
SCHEMBL350950 1.00 TSHR (0.55) TSHRFAAHDGKACES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023189284-A1 PRESSURE-SENSITIVE ADHESIVE COMPOSITION AND PRESSURE-SENSITIVE ADHESIVE SHEET 王子ホールディングス株式会社 2023-10-05 WO disclosed
WO-2023162889-A1 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION THEREOF 株式会社日本触媒 2023-08-31 WO disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed