Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.63 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.63 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | TP53 | P04637 | 3/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7707036 | 1.00 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL2143538 | 1.00 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL8943825 | 1.00 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL8982096 | 1.00 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL8943372 | 1.00 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL1355256 | 0.98 | TSHR (0.60) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL1318703 | 0.93 | TSHR (0.57) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL20505341 | 0.93 | TSHR (0.57) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| Methacrylic Acid SCHEMBL19136847 | 0.90 | TSHR (0.51) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL10479956 | 0.88 | TSHR (0.51) | TSHRALDH1A1CYP3A4HPGDTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 451 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | claimed |
| CN-110967927-B | Photosensitive resin composition and display device including the same | 三星显示有限公司 | 2025-01-28 | — | — | CN | claimed |
| EP-3397693-B1 | MODIFIED ASPHALT USING EPOXIDE-CONTAINING POLYMERS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2024-10-09 | — | — | EP | claimed |
| CN-117866561-A | Adhesive and preparation method and application thereof | 广东省科学院化工研究所 | 2024-04-12 | — | — | CN | claimed |
| EP-4010382-B1 | POLYMER LATEX COMPOSITION FOR THE PREPARATION OF AN ELASTOMERIC FILM HAVING SELF-HEALING PROPERTIES | SYNTHOMER SDN BHD (MY) | 2024-03-20 | — | — | EP | claimed |
| CN-114381156-B | Metal oxide dispersion composition, method for producing same, film composition containing same, optical film, and optical element | 凯斯科技股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| CN-115710438-B | Metal oxide dispersion, thin film composition for display, and optical element for display | 凯斯科技股份有限公司 | 2024-01-30 | — | — | CN | claimed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | claimed |
| CN-113169335-B | Electrode composition for cathode of battery cell of lithium ion battery, cathode slurry composition containing same, cathode and battery | 阿朗新科德国有限责任公司 | 2023-10-13 | — | — | CN | claimed |
| CN-116068853-A | Photosensitive resin composition and display device | 三星显示有限公司 | 2023-05-05 | — | — | CN | claimed |
| US-20140114025-A1 | VULCANIZABLE COMPOSITIONS BASED ON NITRILE RUBBERS CONTAINING EPOXY GROUPS | LANXESS DEUTSCHLAND GMBH (DE) | 2014-04-24 | — | — | US | claimed |
| US-20140114026-A1 | COMPOSITIONS THAT CAN BE VULCANIZED AND THAT ARE BASED ON NITRILE RUBBERS CONTAINING EPOXY GROUPS | LANXESS DEUTSCHLAND GMBH (DE) | 2014-04-24 | — | — | US | claimed |
| US-8563214-B2 | Radiation sensitive resin composition and method of forming an interlayer insulating film | SHARP CORPORATION (JP) | 2013-10-22 | — | — | US | claimed |
| US-8409783-B2 | Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-02 | — | — | US | claimed |
| US-7371499-B2 | Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-05-13 | — | — | US | claimed |
| US-20070128540-A1 | PHOTORESIST RESIN COMPOSITION, METHOD OF FORMING A PHOTORESIST PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-07 | — | — | US | claimed |
| US-20060275700-A1 | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2006-12-07 | — | — | US | claimed |
| US-5530036-A | STORAGE STABLE THERMOSETTING RESIN COMPOSITIONS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-25 | — | — | US | claimed |
| US-5399604-A | Thermosetting resin composition comprising /A/ copolymer of unsaturated carboxylic acid or anhydride, unsaturated compound with epoxy group, unsaturated carboxylic acid ester or other vinyl compound, /B/ organic solvent, /C/ silane coupler | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-03-21 | — | — | US | claimed |
| US-5061587-A | Image fixing at high speed | RICOH COMPANY LTD. (JP) | 1991-10-29 | — | — | US | claimed |