⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28265606 | 0.96 | — | — | |
| SCHEMBL17717613 | 0.84 | — | — | |
| SCHEMBL31633309 | 0.83 | CA12 (0.31) | — | |
| SCHEMBL22042296 | 0.81 | — | — | |
| SCHEMBL21882100 | 0.81 | — | — | |
| SCHEMBL2101236 | 0.81 | — | — | |
| SCHEMBL28774806 | 0.78 | MAPT (0.36) | — | |
| SCHEMBL16606990 | 0.78 | — | — | |
| SCHEMBL22703508 | 0.78 | — | — | |
| SCHEMBL16284821 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4242 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4748968-A1 | METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS | Hansol Chemical Co., Ltd (KR) | 2026-05-27 | — | — | EP | claimed |
| CN-122080276-A | Preparation method and application of polypropylene, polypropylene and application | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080277-A | Polypropylene preparation method, polypropylene and application | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080275-A | Polypropylene and preparation method and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-20260136856-A1 | METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE | ASM IP HOLDING BV (NL) | 2026-05-14 | — | — | US | claimed |
| US-20260136855-A1 | METHOD OF SELECTIVE DEPOSITION ON SUBSTRATE, SUBSTRATE FABRICATED THEREBY, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE COMPRISING SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-14 | — | — | US | claimed |
| US-12628578-B2 | Substrate processing method | ASM IP HOLDING B.V. (NL) | 2026-05-12 | — | — | US | claimed |
| EP-4735662-A1 | IMPROVED DEPOSITION OF HIGH QUALITY METAL OXIDE AND METAL NITRIDE LAYERS | Forge Nano Inc. (US) | 2026-05-06 | — | — | EP | claimed |
| EP-4204219-B1 | PARTIAL COATING OF INTRAOCULAR LENSES USING SPATIAL ALD | AMO GRONINGEN BV (NL) | 2026-05-06 | — | — | EP | claimed |
| US-20260116899-A1 | EXCHANGE RESINS FOR IMPURITY REMOVAL | ENTEGRIS INC (US) | 2026-04-30 | — | — | US | claimed |
| WO-2008142652-A1 | NEW METAL PRECURSORS FOR SEMICONDUCTOR APPLICATIONS | L'AIR LIQUIDE-SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) | 2008-11-27 | — | — | WO | claimed |
| WO-2008121463-A1 | METHOD FOR FORMING STRAINED SILICON NITRIDE FILMS AND A DEVICE CONTAINING SUCH FILMS | TOKYO ELECTRON LIMITED (JP) | 2008-10-09 | — | — | WO | claimed |
| US-20080242116-A1 | Method for forming strained silicon nitride films and a device containing such films | TOKYO ELECTRON LIMITED (JP) | 2008-10-02 | — | — | US | claimed |
| US-20080081104-A1 | chemical vapor deposition; supplying an aminosilane gas to a substrate surface forming absorption layer containing silicon, supplying oxidizing gas selected from oxygen, ozone, nitrogen oxide, nitrogen dioxide, dinitrogen oxide, and water vapor to oxidize silicon to form SiO2 film on target substrate | TOKYO ELECTRON LIMITED (JP) | 2008-04-03 | — | — | US | claimed |
| WO-2008002415-A2 | PRECURSORS FOR DEPOSITING SILICON CONTAINING FILMS AND PROCESSES THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2008-01-03 | — | — | WO | claimed |
| US-20070299274-A1 | Organometallic compounds | PRAXAIR TECHNOLOGY, INC. | 2007-12-27 | — | — | US | claimed |
| EP-0104179-B1 | SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES | GENERAL ELECTRIC COMPANY (US) | 1991-01-02 | — | — | EP | claimed |
| EP-0104179-A4 | SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES. | GEN ELECTRIC (US) | 1984-07-24 | — | — | EP | claimed |
| EP-0104179-A1 | SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES. | GEN ELECTRIC (US) | 1984-04-04 | — | — | EP | claimed |
| WO-1983002948-A1 | SCAVENGERS FOR ONE-COMPONENT ALKOXY-FUNCTIONAL RTV COMPOSITIONS AND PROCESSES | GEN ELECTRIC (US) | 1983-09-01 | — | — | WO | claimed |