Fluoride

Fluoride

SCHEMBL358568

F.F.F.F.[Zr]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL9782986 1.00
Fluoride SCHEMBL3207589 1.00
Fluoride SCHEMBL1539615 1.00
Fluoride SCHEMBL786789 1.00
Fluoride SCHEMBL94297 1.00
Fluoride SCHEMBL786791 1.00
Fluoride SCHEMBL4337958 1.00
Hydrochloric Acid SCHEMBL25201374 0.82
Fluoride SCHEMBL203841 0.82
Fluoride SCHEMBL4309228 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2726 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122010173-A Production method of high-purity hafnium compound 郑州大学 2026-05-12 CN claimed
US-20260068255-A1 SEMICONDUCTOR STRUCTURE WITH SIDEWALL-FREE DIPOLE METAL FEATURE AND METHOD FOR MANUFACTURING THE SAME TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-03-05 US claimed
US-20260026273-A1 OVERLAYER FILMS AND METHODS FOR ETCHING SILICON-CONTAINING MATERIALS USING A LOW TEMPERATURE DRY CHEMICAL ETCH PROCESS TOKYO ELECTRON LTD (JP) 2026-01-22 US claimed
WO-2025226982-A1 DUAL SILICIDE CONTACTS ENABLED WITH ION IMPLANTATION ENTEGRIS, INC. (US) 2025-10-30 WO claimed
US-20250338559-A1 DUAL SILICIDE CONTACTS ENABLED WITH ION IMPLANTATION ENTEGRIS INC (US) 2025-10-30 US claimed
CN-120192679-A Ink, film, light-emitting device and display device 广东聚华印刷显示技术有限公司 2025-06-24 CN claimed
CN-118738534-A Composite halide solid electrolyte, preparation method thereof and battery 宁波市东方理工高等研究院 2024-10-01 CN claimed
CN-118675982-A Deposition of metal borides and metal silicides ASM IP控股有限公司 2024-09-20 CN claimed
CN-118546529-A Toughened flame-retardant acrylic plate and production process thereof 浙江展宇新材料有限公司 2024-08-27 CN claimed
US-12059663-B2 Systems and processes for transferring heat using molten salt during hydrocarbon upgrading DOW GLOBAL TECHNOLOGIES LLC (US) 2024-08-13 US claimed
US-4749785-A REACTING PROTECTED HEXOPYRANOSYL FLUORIDE WITH AGLYCON OR SILYL ETHER THEREOF IN PRESENCE OF METAL FLUORIDE HOECHST AKTIENGESELLSCHAFT (DE) 1988-06-07 US claimed
US-4655827-A Process for the reduction of fluorides of silicon, titanium, zirconium or uranium ENICHEM, S.P.A. (IT) 1987-04-07 US claimed
EP-0212711-A2 Process for the reduction of fluorides of silicon, titanium, zirconium or uranium ENICHEM S.p.A. (IT) 1987-03-04 EP claimed
US-4578252-A PLATING OUT METAL IMPURITY BY ELECTROMOTIVE DISPLACEMENT HUGHES AIRCRAFT COMPANY (US) 1986-03-25 US claimed
EP-0024128-B1 PHOSPHORYLATION PROCESS IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1984-02-01 EP claimed
EP-0043601-B1 PROCESS FOR THE PREPARATION OF ZIRCONIUM TETRAFLUORIDE METALLGESELLSCHAFT AG (DE) 1983-12-28 EP claimed
US-4399118-A Process of recovering anhydrous zirconium tetrafluoride METALLGESELLSCHAFT AKTIENGESELLSCHAFT (DE) 1983-08-16 US claimed
US-4397979-A POLYMERS HAVING CARBONYL IN BACKBONE; IMPROVED MECHANICAL PROPERTIES ALLIED CORPORATION (US) 1983-08-09 US claimed
EP-0055109-A2 Anticaries composition WARNER-LAMBERT COMPANY (US) 1982-06-30 EP claimed
EP-0024128-A2 Phosphorylation process IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1981-02-25 EP claimed