SCHEMBL360228

SCHEMBL360228

O=C(O)c1ccc(-c2ccc(C(=O)O)cc2S(=O)(=O)O)c(S(=O)(=O)O)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CDC25B P30305 2/20 0.53
TTR P02766 2/20 0.50
PTPRC P08575 2/20 0.48
LCK P06239 1/20 0.47
FYN P06241 1/20 0.47
PKM P14618 1/20 0.46
TDP1 Q9NUW8 2/20 0.45
MAPT P10636 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
KMT2A Q03164 2/20 0.45
MEN1 O00255 1/20 0.45
HPGD P15428 1/20 0.45
CDC25A P30304 1/20 0.45
CTDSP1 Q9GZU7 1/20 0.45
TP53 P04637 1/20 0.44
TSHR P16473 1/20 0.44
HTT P42858 1/20 0.44
POLB P06746 2/20 0.43
KDM4E B2RXH2 1/20 0.43
CA12 O43570 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL360967 0.89 CDC25B (0.47) CDC25BTTRPTPRCLCKFYN
SCHEMBL7542974 0.85 CDC25B (0.55) CDC25BTTRLCKFYNPKM
SCHEMBL361052 0.83 CSNK2A2 (0.50) CDC25BTDP1MAPTL3MBTL1KMT2A
SCHEMBL27901682 0.82 CDC25B (0.52) CDC25BLCKFYNPKMTDP1
SCHEMBL271358 0.82 CDC25B (0.52) CDC25BLCKFYNPKMTDP1
SCHEMBL9350997 0.82 KDM4E (0.57) CDC25BLCKFYNPKMTDP1
SCHEMBL359489 0.80 CDC25B (0.50) CDC25BLCKFYNPKMTDP1
Ammonia Solution, Strong SCHEMBL5165172 0.80 CDC25B (0.50) CDC25BLCKFYNPKMTDP1
SCHEMBL306689 0.80 CDC25B (0.50) CDC25BLCKFYNPKMTDP1
SCHEMBL1363387 0.80 CDC25B (0.76) CDC25BLCKFYNPKMTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7288603-B2 Polybenzazole compound having sulfonic acid group and/or phosphonic acid group, resin composition containing the same, resin molding, solid polymer electrolyte membrane, solid polymer electrolyte membrane/electrode assembly and method of preparing assembly TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-10-30 US claimed
EP-1354907-B1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE TOYO BOSEKI (JP) 2006-03-01 EP claimed
EP-1354907-A1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE Toyo Boseki Kabushiki Kaisha (JP) 2003-10-22 EP claimed
CN-109337066-B Reactive and easily-soluble rigid chain polymer and preparation method and composition thereof 浙江大学 2020-08-11 CN disclosed
CN-109440216-B Functionalized aramid superfine fiber and preparation method and application thereof 浙江大学 2020-08-11 CN disclosed
EP-2638126-B1 NEGATIVE DISPERSION RETARDATION PLATE AND ACHROMATIC CIRCULAR POLARIZER CRYSOPTIX KK (JP) 2015-02-18 EP disclosed
EP-2638126-B1 NEGATIVE DISPERSION RETARDATION PLATE AND ACHROMATIC CIRCULAR POLARIZER CRYSOPTIX KK (JP) 2015-02-18 EP disclosed
US-8895118-B2 Negative dispersion retardation plate and achromatic circular polarizer CRYSOPTIX K.K. (JP) 2014-11-25 US disclosed
US-20140334002-A1 PATTERNED RETARDER CRYSOPTIX KK (JP) 2014-11-13 US disclosed
US-20140334002-A1 PATTERNED RETARDER CRYSOPTIX KK (JP) 2014-11-13 US disclosed
US-8557472-B2 Proton conducting polymer membrane, method for production thereof and fuel cell therewith TOYO BOSEKI KABUSHIKI KAISHA (JP) 2013-10-15 US disclosed
US-7288603-B2 Polybenzazole compound having sulfonic acid group and/or phosphonic acid group, resin composition containing the same, resin molding, solid polymer electrolyte membrane, solid polymer electrolyte membrane/electrode assembly and method of preparing assembly TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-10-30 US disclosed
US-20070207361-A1 AROMATIC HYDROCARBON BASED PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-09-06 US disclosed
EP-1826846-A1 AROMATIC HYDROCARBON-BASE PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME Toyo Boseki Kabushiki Kasisha (JP) 2007-08-29 EP disclosed
US-20060166048-A1 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2006-07-27 US disclosed
EP-1354907-B1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE TOYO BOSEKI (JP) 2006-03-01 EP disclosed
EP-1561768-A1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE Toyo Boseki Kabushiki Kaisha (JP) 2005-08-10 EP disclosed
US-20040062969-A1 Polybenzazole compound having sulfo group and/or phosphono group, resin composition containing the same, molded resin, slid polymer electrolyte film, solid electrolyte film/electrode catalyst layer composite, and process for producing the composite TOYO BOSEKI KABUSHIKI KAISHA (JP) 2004-04-01 US disclosed
EP-1354907-A1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE Toyo Boseki Kabushiki Kaisha (JP) 2003-10-22 EP disclosed
JP-2002348273-A 2,2'-DISULFO-4,4'-BIPHENYLDICARBOXYLIC ACID AND ITS DERIVATIVE, AND METHOD FOR PRODUCING THE SAME TOYOBO CO LTD 2002-12-04 JP disclosed