SCHEMBL36038

SCHEMBL36038

CC(=O)OC(C)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2153285 1.00
SCHEMBL2153425 1.00
Water SCHEMBL251200 0.97
Methyl Alcohol SCHEMBL9551986 0.97 TSHR (0.54)
Propylene Glycol SCHEMBL3314707 0.93 TSHR (0.50)
Ether SCHEMBL22472247 0.89 TSHR (0.47)
SCHEMBL10713824 0.82 TSHR (0.45)
Isobutanol SCHEMBL28050779 0.80 TSHR (0.48)
Water SCHEMBL8211970 0.80 TSHR (0.44)
SCHEMBL10331178 0.80 TSHR (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 7201 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
CN-118878823-B Polymer A, preparation method and application thereof 波米科技有限公司 2025-06-10 CN claimed
CN-119882351-A High-adhesion positive KrF photoresist resin composition 万华化学集团股份有限公司 2025-04-25 CN claimed
CN-119805862-A Colored photosensitive resin composition, color filter, developing device and preparation method 阜阳欣奕华新材料科技股份有限公司 2025-04-11 CN claimed
CN-119575758-A Deep ultraviolet photoresist and preparation method thereof 江苏先科半导体新材料有限公司 2025-03-07 CN claimed
CN-115542665-B Positive chemical amplification type photoresist and application method thereof 徐州博康信息化学品有限公司 2025-03-07 CN claimed
CN-115521344-B Metal site substituted metallocene derivative and preparation method and application thereof 中国科学院化学研究所 2025-01-28 CN claimed
CN-119291995-A Thick film KrF photoresist composition and preparation and use methods thereof 徐州博康信息化学品有限公司 2025-01-10 CN claimed
CN-113671793-B Chemical amplification type positive ultraviolet photoresist and preparation and use methods thereof 徐州博康信息化学品有限公司 2024-12-31 CN claimed
US-4444802-A WAXES, ESTERS, ALCOHOLIC COUPLING SOLVENT ASHLAND OIL, INC. (US) 1984-04-24 US claimed
EP-0093324-A1 Water-borne firm coating compositions and processes therefor ASHLAND OIL, INC. (US) 1983-11-09 EP claimed
EP-0093323-A1 Water-borne hard coating compositions and processes therefor ASHLAND OIL, INC. (US) 1983-11-09 EP claimed
EP-0093388-A2 Water-borne soft coating compositions and processes therefor ASHLAND OIL, INC. (US) 1983-11-09 EP claimed
EP-0077974-A1 Process for producing propylene glycol monoacetate KURARAY CO., LTD. (JP) 1983-05-04 EP claimed
US-4338048-A ALKALI METAL SILICATE, GELLING AGENT EXCHEM HOLDINGS LIMITED (GB) 1982-07-06 US claimed
US-4199365-A Foundry compositions containing propylene glycol monoacetate BP CHEMICALS LIMITED (GB) 1980-04-22 US claimed
EP-0001906-A1 Foundry compositions containing propylene glycol monoacetate BP Chemicals Limited (GB) 1979-05-16 EP claimed
WO-1979000245-A1 FOUNDRY COMPOSITIONS CONTAINING PROPYLENE GLYCOL MONOACETATE BP CHEM INT LTD (GB) 1979-05-03 WO claimed
US-3961943-A HYDRAZINE OR HYDROGEN, ALKYLENE GLYCOL ESTER THE DOW CHEMICAL COMPANY (US) 1976-06-08 US claimed