Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNA3 | P22001 | 7/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | CYP1A1 | P04798 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | CYP1B1 | Q16678 | 2/20 | 0.41 |
| ▸ | PDE4A | P27815 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3612950 | 0.86 | KCNA3 (0.53) | KCNA3MAPTCYP1A2CYP3A4ALDH1A1 | |
| SCHEMBL3615484 | 0.78 | CYP3A4 (0.67) | KCNA3MAPTCYP1A2CYP3A4ALDH1A1 | |
| SCHEMBL4391206 | 0.70 | KCNA3 (0.55) | KCNA3MAPTCYP1A2CYP3A4ALDH1A1 | |
| SCHEMBL3607100 | 0.69 | KCNA3 (0.61) | KCNA3CYP1A2CYP3A4ALDH1A1CYP2D6 | |
| SCHEMBL4386477 | 0.68 | KCNA3 (0.46) | KCNA3CYP1A2CYP3A4ALDH1A1CYP2D6 | |
| SCHEMBL4386530 | 0.68 | KCNA3 (0.59) | KCNA3CYP1A2CYP3A4ALDH1A1CYP2D6 | |
| SCHEMBL7279457 | 0.66 | KCNA3 (0.74) | KCNA3MAPTCYP1A2CYP3A4ALDH1A1 | |
| SCHEMBL4390506 | 0.65 | KCNA3 (0.46) | KCNA3CYP1A2CYP3A4ALDH1A1CYP2D6 | |
| SCHEMBL4380645 | 0.65 | KCNA3 (0.46) | KCNA3CYP1A2CYP3A4ALDH1A1CYP2D6 | |
| SCHEMBL10300861 | 0.64 | CYP3A4 (0.72) | KCNA3MAPTCYP1A2CYP3A4ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240063063-A1 | COMPACT CMOS FABRICATION | WELCH JAMES D (US) | 2024-02-22 | — | — | US | disclosed |
| US-11798946-B2 | Compact FINFET CMOS | WELCH JAMES D (US) | 2023-10-24 | — | — | US | disclosed |
| EP-4174907-A1 | METHOD AND APPARATUS FOR MASS ANALYSING A SAMPLE | Tofwerk AG (CH) | 2023-05-03 | — | — | EP | disclosed |
| US-20230117871-A1 | COMPACT CMOS | WELCH JAMES D (US) | 2023-04-20 | — | — | US | disclosed |
| US-20230080743-A1 | Compact CMOS in wide bandgap semiconductor | WELCH JAMES D (US) | 2023-03-16 | — | — | US | disclosed |
| US-20210247688-A1 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | HOYA CORPORATION (JP) | 2021-08-12 | — | — | US | disclosed |
| US-20210020637-A1 | COMPACT FINFET CMOS | WELCH JAMES D (US) | 2021-01-21 | — | — | US | disclosed |
| US-9349407-B2 | Data storage medium surface smoothing method and associated apparatus | HGST Netherlands B.V. (NL) | 2016-05-24 | — | — | US | disclosed |
| US-20130221320-A1 | LED WITH EMBEDDED DOPED CURRENT BLOCKING LAYER | TSMC SOLID STATE LIGHTING LTD. (TW) | 2013-08-29 | — | — | US | disclosed |
| US-20130146562-A1 | DATA STORAGE MEDIUM SURFACE SMOOTHING METHOD AND ASSOCIATED APPARATUS | WESTERN DIGITAL TECHNOLOGIES, INC. | 2013-06-13 | — | — | US | disclosed |
| WO-2005013440-A2 | ELECTRODES FOR FLUORINE GAS DISCHARGE LASERS | CYMER, INC. (A NEVADA CORPORATION) (US) | 2005-02-10 | — | — | WO | disclosed |
| US-20040165638-A1 | Electrodes for fluorine gas discharge lasers | CYMER, LLC | 2004-08-26 | — | — | US | disclosed |
| US-20040071178-A1 | Anodes for fluorine gas discharge lasers | CYMER, LLC | 2004-04-15 | — | — | US | disclosed |
| US-20040066827-A1 | Cathodes for fluorine gas discharge lasers | CYMER, LLC | 2004-04-08 | — | — | US | disclosed |
| US-5834787-A | Device for measuring flux and accumulated dose for an ion beam containing a radioactive element | IMPLANT SCIENCES CORPORATION | 1998-11-10 | — | — | US | disclosed |
| EP-0389198-B1 | Method of manufacturing an X-ray exposure mask and device for controlling the internal stress of thin films | TOSHIBA KK (JP) | 1997-10-15 | — | — | EP | disclosed |
| US-5457324-A | Spectrum analyzer in an ion implanter | APPLIED MATERIALS, INC. (US) | 1995-10-10 | — | — | US | disclosed |
| US-5384465-A | Spectrum analyzer in an ion implanter | APPLIED MATERIALS, INC. (US) | 1995-01-24 | — | — | US | disclosed |
| US-5188706-A | METHOD OF MANUFACTURING AN X-RAY EXPOSURE MASK AND DEVICE FOR CONTROLLING THE INTERNAL STRESS OF THIN FILMS | KABUSHIKI KAISHA TOSHIBA (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0389198-A2 | Method of manufacturing an X-ray exposure mask and device for controlling the internal stress of thin films | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-09-26 | — | — | EP | disclosed |