Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.60 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.60 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.60 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.60 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.60 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.60 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.60 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.60 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.60 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.60 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.60 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.60 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.60 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.60 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.60 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | FFAR1 | O14842 | 5/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.52 |
| ▸ | RXRA | P19793 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL3618619 | 0.98 | SMN1; SMN2 (0.58) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL3196140 | 0.95 | MAPT (0.59) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL5180930 | 0.93 | MAPT (0.62) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL5180251 | 0.93 | MAPT (0.62) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| Hydrochloric Acid SCHEMBL3626622 | 0.93 | MAPT (0.58) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL5078015 | 0.93 | MAPT (0.62) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL3628000 | 0.93 | MAPT (0.62) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL5176085 | 0.93 | MAPT (0.62) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| Hydrochloric Acid SCHEMBL3620483 | 0.91 | MAPT (0.61) | SMN1; SMN2HDAC3MAPK1ADRA1AHDAC4 | |
| SCHEMBL3627111 | 0.89 | FFAR1 (0.59) | FFAR1LMNAKEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103503097-B | Metal oxide semiconductor electrode having porous thin film formed thereon, dye-sensitized solar cell using the same, and method for manufacturing the same | 浦项工科大学校产学协力团 | 2016-11-16 | — | — | CN | claimed |
| CN-103460396-B | DSSC comprising sheath and preparation method thereof | 浦项工科大学校产学协力团 | 2016-06-22 | — | — | CN | claimed |
| US-20140124025-A1 | METAL OXIDE SEMICONDUCTOR ELECTRODE HAVING POROUS THIN FILM, DYE-SENSITIZED SOLAR CELL USING SAME, AND METHOD FOR MANUFACTURING SAME | POSTECH ACADEMY-INDUSTRY FOUNDATION (KR) | 2014-05-08 | — | — | US | claimed |
| US-20140109959-A1 | DYE-SENSITIZED SOLAR CELL COMPRISING ION LAYER AND METHOD FOR MANUFACTURING | POSTECH ACADEMY-INDUSTRY FOUNDATION (KR) | 2014-04-24 | — | — | US | claimed |
| EP-2696373-A1 | DYE-SENSITIZED SOLAR CELL COMPRISING ION LAYER AND METHOD FOR MANUFACTURING SAME | Postech Academy-industry Foundation (KR) | 2014-02-12 | — | — | EP | claimed |
| EP-2696372-A1 | METAL OXIDE SEMICONDUCTOR ELECTRODE HAVING POROUS THIN FILM, DYE-SENSITIZED SOLAR CELL USING SAME, AND METHOD FOR MANUFACTURING SAME | Postech Academy-industry Foundation (KR) | 2014-02-12 | — | — | EP | claimed |
| CN-103503097-A | Metal oxide semiconductor electrode having porous thin film formed thereon, dye-sensitized solar cell using the same, and method for manufacturing the same | POSTECH ACAD IND FOUND | 2014-01-08 | — | — | CN | claimed |
| CN-103460396-A | Dye-sensitized solar cell comprising ion layer and method for manufacturing same | POSTECH ACAD IND FOUND | 2013-12-18 | — | — | CN | claimed |
| CN-103503097-B | Metal oxide semiconductor electrode having porous thin film formed thereon, dye-sensitized solar cell using the same, and method for manufacturing the same | 浦项工科大学校产学协力团 | 2016-11-16 | — | — | CN | disclosed |
| CN-103460396-B | DSSC comprising sheath and preparation method thereof | 浦项工科大学校产学协力团 | 2016-06-22 | — | — | CN | disclosed |
| US-9316915-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20150147698-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20140124025-A1 | METAL OXIDE SEMICONDUCTOR ELECTRODE HAVING POROUS THIN FILM, DYE-SENSITIZED SOLAR CELL USING SAME, AND METHOD FOR MANUFACTURING SAME | POSTECH ACADEMY-INDUSTRY FOUNDATION (KR) | 2014-05-08 | — | — | US | disclosed |
| US-20140109959-A1 | DYE-SENSITIZED SOLAR CELL COMPRISING ION LAYER AND METHOD FOR MANUFACTURING | POSTECH ACADEMY-INDUSTRY FOUNDATION (KR) | 2014-04-24 | — | — | US | disclosed |
| US-20040220346-A1 | Multi-branched polymer, process for producing the same, and applications thereof | MITSUI CHEMICALS, INC. (JP) | 2004-11-04 | — | — | US | disclosed |
| CN-1537876-A | Multi-branch polymer, its production method and its application | ������ѧ��ʽ���� | 2004-10-20 | — | — | CN | disclosed |
| EP-1457512-A1 | Multi-branched polymer, process for producing the same, and applications thereof | Mitsui Chemicals, Inc. (JP) | 2004-09-15 | — | — | EP | disclosed |
| CN-1495209-A | Polyolefine macromonomer, graftmer obtained by utilizing polyolefine macromonomer and its application | ������ѧ��ʽ���� | 2004-05-12 | — | — | CN | disclosed |
| WO-2004037889-A1 | POLYHYDROXYALKANOATE, PROCESS FOR PREPARING THE SAME, AND RESIN COMPOSITION CONTAINING THE POLYHYDROXYALKANOATE | CANON KABUSHIKI KAISHA (JP) | 2004-05-06 | — | — | WO | disclosed |
| EP-1396504-A2 | Polyolefin macromonomer, graft polymer obtained from the polyolefin macromonomer, and use thereof | Mitsui Chemicals, Inc. (JP) | 2004-03-10 | — | — | EP | disclosed |