Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 3/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | ENPP3 | O14638 | 2/20 | 0.40 |
| ▸ | ENPP1 | P22413 | 2/20 | 0.40 |
| ▸ | ENPP2 | Q13822 | 2/20 | 0.40 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12204577 | 0.98 | CYP2D6 (0.47) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL10809927 | 0.98 | CYP2D6 (0.47) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL2632449 | 0.98 | CYP2D6 (0.47) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL10810981 | 0.97 | CYP2D6 (0.46) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL10814260 | 0.94 | CYP2D6 (0.48) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL2632440 | 0.84 | CYP2D6 (0.45) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL12204220 | 0.84 | CYP2D6 (0.45) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL8744474 | 0.77 | CYP2D6 (0.60) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL777214 | 0.77 | CYP2D6 (0.63) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR | |
| SCHEMBL8744470 | 0.77 | CYP2D6 (0.60) | CYP2D6CYP1A2ALDH1A1CYP3A4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-111381447-B | Photosensitive resin composition, laminate, and pattern forming method | 信越化学工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-111234236-B | Siloxane polymer containing isocyanuric acid and polyether skeleton, photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2023-03-24 | — | — | CN | disclosed |
| CN-111205463-B | Polysiloxane skeleton polymer, photosensitive resin composition, pattern forming method and manufacturing of optical semiconductor device | 信越化学工业株式会社 | 2023-02-14 | — | — | CN | disclosed |
| CN-108388082-B | Photosensitive resin composition, photosensitive dry film, photosensitive resin coating and pattern forming method | 信越化学工业株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-115044040-A | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2022-09-13 | — | — | CN | disclosed |
| CN-115023653-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern formation method | 信越化学工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| CN-114746809-A | Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, pattern forming method, and light-emitting element | 信越化学工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-109422881-B | Epoxy group-containing isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern formation method | 信越化学工业株式会社 | 2022-04-19 | — | — | CN | disclosed |
| CN-114253069-A | Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-03-29 | — | — | CN | disclosed |
| CN-105487337-B | Chemically amplified negative resist composition, photocurable dry film, method for producing the same, and patterning method | 信越化学工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-111234236-A | Siloxane polymer containing isocyanuric acid and polyether skeleton, photosensitive resin composition, and pattern formation method | 信越化学工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-111198480-A | Photosensitive resin composition, pattern forming method and antireflection film | 信越化学工业株式会社 | 2020-05-26 | — | — | CN | disclosed |
| CN-111142332-A | Photosensitive resin composition and photosensitive dry film | 信越化学工业株式会社 | 2020-05-12 | — | — | CN | disclosed |
| CN-111045292-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-110727175-A | Photosensitive resin composition and pattern forming method | 信越化学工业株式会社 | 2020-01-24 | — | — | CN | disclosed |
| CN-110727174-A | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film and black matrix | 信越化学工业株式会社 | 2020-01-24 | — | — | CN | disclosed |
| CN-105315467-B | Polymer having organosilicon structure, negative resist composition, photocurable dry film, and patterning method | 信越化学工业株式会社 | 2019-12-20 | — | — | CN | disclosed |
| EP-2219076-B1 | COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2013-11-20 | — | — | EP | disclosed |
| EP-2219076-A1 | COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-08-18 | — | — | EP | disclosed |