SCHEMBL3626409

SCHEMBL3626409

c1ccc(-c2ccc3oc(-c4ccccc4)cc3c2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 4/20 0.68
PGR P06401 1/20 0.58
ESR1 P03372 1/20 0.56
ESR2 Q92731 1/20 0.56
CHRM2 P08172 1/20 0.56
CHRM4 P08173 1/20 0.56
CHRM5 P08912 1/20 0.56
CHRM1 P11229 1/20 0.56
CHRM3 P20309 1/20 0.56
PLA2G2A P14555 4/20 0.56
PLA2G4A P47712 4/20 0.56
FFAR1 O14842 1/20 0.54
APP P05067 1/20 0.50
PLA2G10 O15496 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA9 Q16790 1/20 0.47
CYP1A1 P04798 1/20 0.47
CYP1A2 P05177 1/20 0.47
FYN P06241 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11699010 0.91 MAOB (0.78) MAOBPGRESR1ESR2CHRM2
SCHEMBL11470530 0.91 MAOB (0.70) MAOBPGRESR1ESR2CHRM2
SCHEMBL11822400 0.90 MAOB (0.57) MAOBPGRESR1ESR2CHRM2
SCHEMBL25465740 0.90 MAOB (0.57) MAOBPGRESR1ESR2CHRM2
SCHEMBL11806213 0.90 MAOB (0.57) MAOBPGRESR1ESR2CHRM2
SCHEMBL20804736 0.88 MAOB (0.61) MAOBESR1ESR2PLA2G2APLA2G4A
SCHEMBL23549921 0.88 MAOB (0.61) MAOBESR1ESR2PLA2G2APLA2G4A
SCHEMBL1601919 0.87 MAOB (0.54) MAOBPGRESR1ESR2CHRM2
SCHEMBL5768216 0.86 MAOB (0.72) MAOBPGRPLA2G2APLA2G4ACA1
SCHEMBL23337583 0.86 MAOB (0.59) MAOBESR1ESR2PLA2G2APLA2G4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114895535-B Super-resolution lithography method based on double-step absorption effect and STED principle 之江实验室 2022-12-02 CN claimed
CN-114895535-A Super-resolution lithography method based on double-step absorption effect and STED principle 之江实验室 2022-08-12 CN claimed
EP-0486216-B1 Light-sensitive silver halide photographic material KONISHIROKU PHOTO IND (JP) 1998-08-26 EP claimed
EP-3898181-B1 PARALLELISED 3D LITHOGRAPHY USING MUTI-BEAM, MULTI-COLOUR LIGHT-INDUCED POLYMERISATION KARLSRUHER INST TECHNOLOGIE (DE) 2025-01-01 EP disclosed
US-20240198581-A2 Parallelized 3D Lithography Using Multi-Beam, Multi-Color Light-Induced Polymerization Karlsruher Institut für Technologie (DE) 2024-06-20 US disclosed
US-11999098-B2 Parallelized 3D lithography using multi-beam, multi-color light-induced polymerization Karlsruher Institut für Technologie (DE) 2024-06-04 US disclosed
WO-2023132488-A1 COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME 주식회사 엘지화학 2023-07-13 WO disclosed
CN-114895535-B Super-resolution lithography method based on double-step absorption effect and STED principle 之江实验室 2022-12-02 CN disclosed
CN-114895535-A Super-resolution lithography method based on double-step absorption effect and STED principle 之江实验室 2022-08-12 CN disclosed
WO-2022061981-A1 DOPED METAL SULFIDE AND PREPARATION AND APPLICATION THEREOF 苏州大学 2022-03-31 WO disclosed
US-20220055290-A1 Parallelized 3D Lithography Using Multi-Beam, Multi-Color Light-Induced Polymerization KARLSRUHER INST TECHNOLOGIE (DE) 2022-02-24 US disclosed
EP-3898181-A1 PARALLELISED 3D LITHOGRAPHY USING MUTI-BEAM, MULTI-COLOUR LIGHT-INDUCED POLYMERISATION Karlsruher Institut für Technologie (DE) 2021-10-27 EP disclosed
WO-2020126154-A1 PARALLELISED 3D LITHOGRAPHY USING MUTI-BEAM, MULTI-COLOUR LIGHT-INDUCED POLYMERISATION Karlsruher Institut für Technologie (DE) 2020-06-25 WO disclosed
US-7737084-B2 Image fading preventing agent, image forming element, recording medium, image forming method and image CANON KABUSHIKI KAISHA (JP) 2010-06-15 US disclosed
US-7473786-B1 Methods and systems for preparing fused heterocyclic compounds using copper(I) catalysts UNIVERSITY OF MASSACHUSETTS (US) 2009-01-06 US disclosed
US-7473786-B1 Methods and systems for preparing fused heterocyclic compounds using copper(I) catalysts UNIVERSITY OF MASSACHUSETTS (US) 2009-01-06 US disclosed
US-7473786-B1 Methods and systems for preparing fused heterocyclic compounds using copper(I) catalysts UNIVERSITY OF MASSACHUSETTS (US) 2009-01-06 US disclosed
US-20070093386-A1 IMAGE FADING PREVENTING AGENT, IMAGE FORMING ELEMENT, RECORDING MEDIUM, IMAGE FORMING METHOD AND IMAGE CANON KABUSHIKI KAISHA (JP) 2007-04-26 US disclosed
EP-0486216-B1 Light-sensitive silver halide photographic material KONISHIROKU PHOTO IND (JP) 1998-08-26 EP disclosed
EP-0486216-A1 Light-sensitive silver halide photographic material KONICA CORPORATION (JP) 1992-05-20 EP disclosed