SCHEMBL3634545

SCHEMBL3634545

CCC1=C([Fe])CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6322527 0.79
SCHEMBL27808844 0.78
SCHEMBL2591738 0.77
SCHEMBL4477480 0.77
SCHEMBL958607 0.75
SCHEMBL2831195 0.75
SCHEMBL8575865 0.72
SCHEMBL924241 0.72
SCHEMBL3853198 0.72
SCHEMBL1485897 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101801987-A Methods of forming thin metal-containing films by cvd or ald using iron, ruthenium or osmium cyclopentadiene carbon monoxide complexes SIGMA ALDRICH CO 2010-08-11 CN claimed
CN-101801988-A Organometallic Precursors for Chemical Phase Deposition Processes SIGMA ALDRICH CO 2010-08-11 CN claimed
CN-101781336-A Organometallic compounds, processes and methods of use PRAXAIR TECHNOLOGY INC 2010-07-21 CN claimed
CN-102203224-B Improvement in or relating to fuel additive compositions INNOSPEC LTD 2015-06-03 CN disclosed
CN-101801987-B Methods of forming thin metal-containing films by CVD SIGMA ALDRICH CO 2014-03-26 CN disclosed
CN-101801988-B Organometallic Precursors for Chemical Phase Deposition Processes SIGMA ALDRICH CO 2013-03-06 CN disclosed
CN-1840554-B Polar monomer-olefin copolymer and process for producing the same SUMITOMO CHEMICAL CO., LTD. (JP) 2011-11-30 CN disclosed
CN-102203224-A Improvement in or relating to fuel additive compositions INNOSPEC LTD 2011-09-28 CN disclosed
CN-101801988-A Organometallic Precursors for Chemical Phase Deposition Processes SIGMA ALDRICH CO 2010-08-11 CN disclosed
CN-101801987-A Methods of forming thin metal-containing films by cvd or ald using iron, ruthenium or osmium cyclopentadiene carbon monoxide complexes SIGMA ALDRICH CO 2010-08-11 CN disclosed
CN-101781336-A Organometallic compounds, processes and methods of use PRAXAIR TECHNOLOGY INC 2010-07-21 CN disclosed
EP-2171021-A2 IMPROVEMENTS IN OR RELATING TO HYDROCARBON COMPOSITIONS Innospec Limited (GB) 2010-04-07 EP disclosed
CN-101636476-A Composition, method and use INNOSPEC LTD 2010-01-27 CN disclosed
WO-2009013536-A2 IMPROVEMENTS IN OR RELATING TO HYDROCARBON COMPOSITIONS INNOSPEC LIMITED (GB) 2009-01-29 WO disclosed
CN-1840554-A Polar monomer-olefin copolymer and process for producing the same SUMITOMO CHEMICAL CO (JP) 2006-10-04 CN disclosed
CN-1102161-C Photocurable composition THREE BOND CO LTD (JP) 2003-02-26 CN disclosed
CN-1153794-A Photocurable composition THREE BOND CO LTD (JP) 1997-07-09 CN disclosed