Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 3/20 | 0.63 |
| ▸ | MAPT | P10636 | 3/20 | 0.53 |
| ▸ | PLA2G2A | P14555 | 2/20 | 0.53 |
| ▸ | PLA2G5 | P39877 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.53 |
| ▸ | MEN1 | O00255 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.53 |
| ▸ | ATM | Q13315 | 1/20 | 0.53 |
| ▸ | HSD17B3 | P37058 | 7/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.47 |
| ▸ | SELL | P14151 | 1/20 | 0.47 |
| ▸ | SELP | P16109 | 1/20 | 0.47 |
| ▸ | TLR2 | O60603 | 1/20 | 0.44 |
| ▸ | NSD2 | O96028 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | MPI | P34949 | 1/20 | 0.44 |
| ▸ | GRK6 | P43250 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10351740 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL9806374 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL8142713 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL9806444 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL3277095 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL8823487 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL10350952 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL10794438 | 0.98 | HTT (0.61) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL10350961 | 0.95 | HTT (0.56) | HTTMAPTPLA2G2APLA2G5ALDH1A1 | |
| SCHEMBL11419973 | 0.91 | SELL (0.56) | HTTMAPTALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-4702010-A1 | PHOTOACTIVE COMPOUNDS | Merck Patent GmbH (DE) | 2026-03-04 | — | — | EP | disclosed |
| EP-4596607-A1 | RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| EP-4597225-A1 | FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250230283-A1 | RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-07-17 | — | — | US | disclosed |
| WO-2024223739-A1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2024-10-31 | — | — | WO | disclosed |
| WO-2024185652-A1 | RESIN COMPOSITION, CURED PRODUCT, MULTILAYER BODY, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2024-09-12 | — | — | WO | disclosed |
| WO-2024150700-A1 | RESIN COMPOSITION, CURED ARTICLE, MULTILAYER BODY, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024143210-A1 | MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER | 富士フイルム株式会社 | 2024-07-04 | — | — | WO | disclosed |
| EP-0555861-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-08-18 | — | — | EP | disclosed |
| EP-0510446-A1 | Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| US-5143816-A | Lithography printing plates; good adhesion | FUJI PHOTO FILM CO., LTD. (JP) | 1992-09-01 | — | — | US | disclosed |
| EP-0445819-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |
| EP-0193166-B1 | LIGHT-SENSITIVE COMPOSITION AND LIGHT-SENSITIVE POSITIVE REGISTRATION MATERIAL | HOECHST CELANESE CORPORATION (US) | 1991-05-08 | — | — | EP | disclosed |
| EP-0410760-A2 | Light-sensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-30 | — | — | EP | disclosed |
| EP-0307752-A2 | Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use | HOECHST AKTIENGESELLSCHAFT (DE) | 1989-03-22 | — | — | EP | disclosed |
| EP-0193166-A2 | Light-sensitive composition and light-sensitive positive registration material | HOECHST CELANESE CORPORATION (US) | 1986-09-03 | — | — | EP | disclosed |
| US-4588670-A | Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist | AMERICAN HOECHST CORPORATION (US) | 1986-05-13 | — | — | US | disclosed |