SCHEMBL3668837

SCHEMBL3668837

CO[Si](OC)(C1=CC=CC1)C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27341120 0.83
SCHEMBL4996000 0.82
SCHEMBL1703360 0.80
SCHEMBL4999945 0.80
SCHEMBL4993659 0.80
SCHEMBL5005245 0.78
SCHEMBL9143834 0.78
SCHEMBL9145186 0.78
SCHEMBL8470010 0.76
SCHEMBL727183 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116355118-A External electron donor with dual activity and application thereof 山东鲁晶化工科技有限公司 2023-06-30 CN claimed
CN-119998342-A Process for producing high flowability heterophasic propylene copolymer composition 博里利斯股份公司 2025-05-13 CN disclosed
CN-118369378-A Polypropylene resin composition and use thereof 普瑞曼聚合物株式会社 2024-07-19 CN disclosed
CN-116355118-A External electron donor with dual activity and application thereof 山东鲁晶化工科技有限公司 2023-06-30 CN disclosed
CN-114660896-A Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2022-06-24 CN disclosed
CN-111856882-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2020-10-30 CN disclosed
CN-111208710-A Iodine-containing thermosetting silicon-containing material, resist underlayer film-forming composition for extreme ultraviolet lithography containing the same, and pattern formation method 信越化学工业株式会社 2020-05-29 CN disclosed
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
CN-102947393-B Typical metal containing polysiloxane composition, process for production of same, and uses thereof TOSOH CORP 2015-03-11 CN disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
CN-1105680-A Polypropylene composition MITSUI PETROCHEMICAL IND (JP) 1995-07-26 CN disclosed
US-5412020-A Impact strength MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-05-02 US disclosed
EP-0636650-A1 Propylene polymer compositions MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1995-02-01 EP disclosed
CN-1087094-A Solid titanium catalyst component of olefinic polyreaction and preparation method thereof, the catalyzer of olefinic polyreaction and method thereof MITSUI PETROCHEMICAL IND (JP) 1994-05-25 CN disclosed
EP-0585869-A1 Solid titanium catalyst component for olefin polymerization, process for preparing the same, catalyst for olefin polymerization and process for olefin polymerization MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1994-03-09 EP disclosed
EP-0582278-A2 Method for producing a polyolefin TOSOH CORPORATION (JP) 1994-02-09 EP disclosed
US-5244989-A METHOD FOR PRODUCING A STEREOSPECIFIC POLYOLEFIN TOSOH CORPORATION (JP) 1993-09-14 US disclosed
EP-0530814-A1 Method for producing a stereospecific polyolefin TOSOH CORPORATION (JP) 1993-03-10 EP disclosed
EP-0504744-A2 Method for producing a stereospecific polyolefin TOSOH CORPORATION (JP) 1992-09-23 EP disclosed
EP-0475134-A2 Method for producing a stereospecific polyolefin Tosoh Corporation (JP) 1992-03-18 EP disclosed