SCHEMBL36715

SCHEMBL36715

C=C(C)C(=O)OCCOC(=O)c1ccccc1C(=O)O

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.56
ALDH1A1 P00352 8/20 0.53
TDP1 Q9NUW8 5/20 0.50
L3MBTL1 Q9Y468 3/20 0.50
CYP3A4 P08684 4/20 0.49
MAPK1 P28482 3/20 0.49
TP53 P04637 2/20 0.49
LMNA P02545 1/20 0.47
POLB P06746 1/20 0.47
APEX1 P27695 1/20 0.47
HTT P42858 1/20 0.47
THRB P10828 1/20 0.45
NPC1 O15118 2/20 0.44
HPGD P15428 2/20 0.44
RAB9A P51151 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
HSD17B10 Q99714 2/20 0.44
GLA P06280 1/20 0.44
HIF1A Q16665 1/20 0.44
ALOX15 P16050 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4783599 1.00 TSHR (0.56) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL29366686 1.00 TSHR (0.56) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL2859734 0.98 TSHR (0.54) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL28190689 0.98 TSHR (0.54) TSHRALDH1A1TDP1L3MBTL1CYP3A4
Methacrylic Acid SCHEMBL14800721 0.97 TSHR (0.53) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL1398204 0.96 TSHR (0.51) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL194453 0.94 TSHR (0.55) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL194750 0.94 TSHR (0.58) TSHRALDH1A1TDP1L3MBTL1CYP3A4
SCHEMBL129437 0.94 TSHR (0.62) TSHRALDH1A1TDP1L3MBTL1CYP3A4
Phthalic Acid SCHEMBL4599263 0.94 TDP1 (0.51) TSHRALDH1A1TDP1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4166 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3782599-B1 DENTAL POLYMERIZABLE COMPOSITION BASED ON CONDENSED SILANES VOCO GMBH (DE) 2025-09-17 EP claimed
EP-3426703-B1 IMPROVED HYDROPHILIC COMPOSITIONS SUPERDIELECTRICS SUPERCAP LTD (GB) 2025-09-03 EP claimed
US-12337043-B2 Curable radiopaque substance MERZ DENTAL GMBH (DE) 2025-06-24 US claimed
US-12322547-B2 Integrated polymer materials for use in electrochemical cells SUPERDIELECTRICS SUPERCAP LTD (GB) 2025-06-03 US claimed
CN-117025052-B Water-based superhydrophobic consolidation material for TIT (tungsten inert gas) embedding seal layer 北京中科安途交通科技有限公司 2025-05-06 CN claimed
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US claimed
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
CN-119752400-A Chemical corrosion resistant easy-to-clean organosilicon modified acrylic adhesive and preparation method thereof 东莞市博翔电子材料有限公司 2025-04-04 CN claimed
CN-119552345-A Modified polyurethane resin, semi-cured material, composite material and preparation method thereof 解合元(上海)资源再生科技有限公司 2025-03-04 CN claimed
CN-119552346-A Modified polyurethane resin, modified thermosetting resin and preparation method thereof 解合元(上海)资源再生科技有限公司 2025-03-04 CN claimed
US-5126228-A Presensitized FUJI PHOTO FILM, CO., LTD. (JP) 1992-06-30 US claimed
US-5089051-A Photopolymerizable (meth)acryloyloxyalkyl hydrogen phosphates and mono- and dicarboxylic acid (meth)acryloyloxyethyl esters; high bonding strength HERAEUS KULZER GMBH (DE) 1992-02-18 US claimed
US-5059511-A Curable silicone rubber layer on light sensitive resin of (meth)acryloyl and allyl monomers, photoinitiators FUJI PHOTO FILM CO., LTD. (JP) 1991-10-22 US claimed
US-4985474-A PLUGGING HOLES IN PRINTED CIRCUIT BOARDS SOMAR CORPORATION (JP) 1991-01-15 US claimed
EP-0386777-A2 PS plate for use in making lithographic printing plate requiring no dampening water Fuji Photo Film Co., Ltd. (JP) 1990-09-12 EP claimed
US-4874686-A PHOTOSENSITIVE LAYER CONTAINING AN ALLYL COPOLYMER AND A HYDROSILATED-CROSSLINKED SILICONE RUBBER LAYER; ADHESION; REPREODUCTION; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1989-10-17 US claimed
EP-0333186-A2 Photosensitive lithographic plate necessitating no dampening water FUJI PHOTO FILM CO., LTD. (JP) 1989-09-20 EP claimed
US-4389460-A ORGANOTIN UNIT GRAFTED TO CONJUGATED DIENE INSTITUT FRANCAIS DU PETROLE (FR) 1983-06-21 US claimed
US-4262097-A CONTAINING TIN AND CHLORINE INSTITUT FRANCAIS DU PETROLE (FR) 1981-04-14 US claimed
US-4023973-A PRINTING JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1977-05-17 US claimed