Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.37 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.37 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.37 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | PYGL | P06737 | 1/20 | 0.31 |
| ▸ | BCHE | P06276 | 2/20 | 0.31 |
| ▸ | ACHE | P22303 | 2/20 | 0.31 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.31 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3023839 | 0.92 | CNR1 (0.50) | CNR1MAPTCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL18986434 | 0.87 | CNR1 (0.56) | CNR1MAPTEPHX2ALDH1A1BCHE | |
| SCHEMBL822981 | 0.85 | CNR1 (0.54) | CNR1EPHX2ALDH1A1BCHEACHE | |
| SCHEMBL3019868 | 0.85 | CNR1 (0.54) | CNR1MAPTCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL20725634 | 0.85 | CNR1 (0.54) | CNR1EPHX2ALDH1A1BCHEACHE | |
| SCHEMBL25130197 | 0.85 | CNR1 (0.46) | CNR1MAPTNPC1RAB9AEPHX2 | |
| SCHEMBL3673345 | 0.85 | CNR1 (0.54) | CNR1MAPTCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL25984974 | 0.84 | CNR1 (0.50) | CNR1EPHX2ALDH1A1BCHEACHE | |
| SCHEMBL27354642 | 0.83 | CNR1 (0.45) | CNR1MAPTCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL27638653 | 0.83 | PHF8 (0.52) | CNR1MAPTNPC1RAB9AEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070272282-A1 | Composition for Removing Photoresist and Method for Removing Photoresist | NAGASE CHEMTEX CORPORATION (JP) | 2007-11-29 | — | — | US | claimed |
| US-7132460-B2 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI RAYON CO., LTD. (JP) | 2006-11-07 | — | — | US | claimed |
| US-10927198-B2 | Methacrylic acid ester polymer, method for producing same, active energy ray-curable composition, and optical recording medium | MITSUBISHI CHEMICAL CORPORATION (JP) | 2021-02-23 | — | — | US | disclosed |
| EP-2792691-B1 | METHACRYLIC ACID ESTER POLYMER, METHOD FOR PRODUCING SAME, ACTIVE ENERGY RAY-CURABLE COMPOSITION, AND OPTICAL RECORDING MEDIUM | MITSUBISHI RAYON CO (JP) | 2016-12-07 | — | — | EP | disclosed |
| US-20140349129-A1 | METHACRYLIC ACID ESTER POLYMER, METHOD FOR PRODUCING SAME, ACTIVE ENERGY RAY-CURABLE COMPOSITION, AND OPTICAL RECORDING MEDIUM | MITSUBISHI RAYON CO.,LTD. (JP) | 2014-11-27 | — | — | US | disclosed |
| EP-2792691-A1 | METHACRYLIC ACID ESTER POLYMER, METHOD FOR PRODUCING SAME, ACTIVE ENERGY RAY-CURABLE COMPOSITION, AND OPTICAL RECORDING MEDIUM | Mitsubishi Rayon Co., Ltd. (JP) | 2014-10-22 | — | — | EP | disclosed |
| EP-1350816-B1 | ACTIVE ENERGY RAY CURABLE COMPOSITION FOR COATING OPTICAL DISK AND OPTICAL DISK | MITSUBISHI RAYON CO (JP) | 2010-06-02 | — | — | EP | disclosed |
| US-7344768-B2 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI RAYON CO., LTD. (JP) | 2008-03-18 | — | — | US | disclosed |
| US-7341771-B2 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI RAYON CO., LTD. (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20070272282-A1 | Composition for Removing Photoresist and Method for Removing Photoresist | NAGASE CHEMTEX CORPORATION (JP) | 2007-11-29 | — | — | US | disclosed |
| US-7132460-B2 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI RAYON CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| US-20060167200-A1 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI RAYON CO., LIMITED (JP) | 2006-07-27 | — | — | US | disclosed |
| US-20060166140-A1 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI RAYON CO., LIMITED (JP) | 2006-07-27 | — | — | US | disclosed |
| US-20040013976-A1 | Active energy ray curable composition for coating optical disk and optical disk | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1350816-A1 | ACTIVE ENERGY RAY CURABLE COMPOSITION FOR COATING OPTICAL DISK AND OPTICAL DISK | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-08 | — | — | EP | disclosed |