SCHEMBL3680382

SCHEMBL3680382

C[SiH2]O[SiH](C)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12909801 0.94
SCHEMBL176361 0.87
SCHEMBL8984143 0.84
SCHEMBL3688172 0.79
SCHEMBL12701976 0.77
SCHEMBL14253603 0.75
SCHEMBL18406279 0.75
SCHEMBL16382435 0.75
SCHEMBL4315293 0.73
SCHEMBL15372755 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230295426-A1 RUBBER PARTICLES, COMPOSITE PARTICLES AND PRODUCTION METHODS THEREOF SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
EP-2513125-B1 METAL COMPLEXES WITH DIAZABENZIMIDAZOLECARBENE LIGANDS AND THEIR USE IN OLEDS BASF SE (DE) 2014-10-29 EP disclosed
CN-1981069-B Composition containing siloxane compound and phenol compound ADEKA CORP 2010-09-08 CN disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed
CN-1981069-A Composition containing siloxane compound and phenol compound ADEKA CORP (JP) 2007-06-13 CN disclosed