SCHEMBL3682864

SCHEMBL3682864

CC[CH][SiH2]OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17578912 0.75
SCHEMBL5077995 0.71
SCHEMBL5036721 0.65
SCHEMBL19894260 0.64
SCHEMBL3104917 0.61
SCHEMBL643394 0.61
SCHEMBL3677351 0.57
SCHEMBL7576986 0.57
SCHEMBL133769 0.57
SCHEMBL7521603 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3508541-B1 TWO-COMPONENT ADHESIVE COMPOSITION LG CHEMICAL LTD (KR) 2021-07-14 EP claimed
US-10988640-B2 Two-component adhesive composition LG CHEM, LTD. 2021-04-27 US claimed
US-20190300754-A1 Two-Component Adhesive Composition LG CHEM, LTD. (KR) 2019-10-03 US claimed
EP-3508541-A1 TWO-COMPONENT ADHESIVE COMPOSITION LG Chem, Ltd. (KR) 2019-07-10 EP claimed
EP-1853671-B1 CONDUCTIVE INKS AND MANUFACTURING METHOD THEREOF INKTEC CO LTD (KR) 2013-07-31 EP claimed
US-20080206488-A1 Conductive Inks and Manufacturing Method Thereof INKTEC CO., LTD. (KR) 2008-08-28 US claimed
WO-2024053298-A1 ACTIVE ENERGY RAY CURING-TYPE ANTIFOGGING COATING COMPOSITION, CURED MATERIAL, AND LAMINATE DIC株式会社 2024-03-14 WO disclosed
CN-112174611-B Regenerated building material and preparation method thereof 丰城市复建高科有限公司 2022-08-26 CN disclosed
CN-113372725-A Single-component addition type thermosetting silicone rubber composition 广东恒大新材料科技有限公司 2021-09-10 CN disclosed
EP-3508541-B1 TWO-COMPONENT ADHESIVE COMPOSITION LG CHEMICAL LTD (KR) 2021-07-14 EP disclosed
US-10988640-B2 Two-component adhesive composition LG CHEM, LTD. 2021-04-27 US disclosed
CN-112174611-A Regenerated building material and preparation method thereof 康亚男 2021-01-05 CN disclosed
WO-2020194831-A1 INK SET FOR INKJET RECORDING, AND IMAGE RECORDING METHOD 富士フイルム株式会社 2020-10-01 WO disclosed
US-20090270558-A1 Functionalized Polyvinylaromatic Nanoparticles MICHELIN RECHERCHE ET TECHNIQUE S.A. (CH) 2009-10-29 US disclosed
EP-1650565-B1 SURFACE OF BASE MATERIAL BEING INHIBITED IN NON-SPECIFIC ADSORPTION JSR CORP (JP) 2009-03-25 EP disclosed
US-20080132644-A1 copolymer of styrene, ethylvinylbenzene, divinylbenzene and trimethoxysilylpropyl(meth)acrylate, being in the form of nanobeads as reinforcing filler; tires or rubber semi-finished products intended for these tires MICHELIN RECHERCHE ET TECHNIQUE S.A. (CH) 2008-06-05 US disclosed
US-20060240438-A1 Surface of base material being inhibited in non-specific adsorption JSR CORPORATION (JP) 2006-10-26 US disclosed
EP-1650565-A1 SURFACE OF BASE MATERIAL BEING INHIBITED IN NON-SPECIFIC ADSORPTION Tokyo University of Science, Educational Foundation (JP) 2006-04-26 EP disclosed
EP-0392797-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-10-17 EP disclosed
EP-0376650-A2 Liquid developer for electrostatic photography FUJI PHOTO FILM CO., LTD. (JP) 1990-07-04 EP disclosed