SCHEMBL3684462

SCHEMBL3684462

C[SiH2]O[Si](C)(C)O[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13105828 0.87
SCHEMBL7761479 0.84
SCHEMBL41580 0.77
SCHEMBL7761463 0.76
SCHEMBL11762513 0.75
SCHEMBL14011112 0.75
SCHEMBL133734 0.75
SCHEMBL8393856 0.74
SCHEMBL19927315 0.74
SCHEMBL19927025 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180004088-A1 SILICONE SKELETON-CONTAINING POLYMER, PHOTO-CURABLE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM, LAMINATE, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-04 US disclosed
US-9765191-B2 Gels AORTECH INTERNATIONAL PLC (GB) 2017-09-19 US disclosed
US-20170121464-A1 GELS AORTECH BIOMATERIALS PTY LTD. (AU) 2017-05-04 US disclosed
US-20170114187-A9 GELS AORTECH INTERNATIONAL PLC (GB) 2017-04-27 US disclosed
US-20140323676-A1 GELS AORTECH INTERNATIONAL PLC (GB) 2014-10-30 US disclosed
US-8623986-B2 Gels Aertech International plc (GB) 2014-01-07 US disclosed
US-8470951-B2 Silicone composition suitable for cross-linking by dehydrocondensation in the presence of a metal catalyst BLUESTAR SILICONES FRANCE SAS (FR) 2013-06-25 US disclosed
US-20120172472-A1 SILICONE COMPOSITION SUITABLE FOR CROSS-LINKING BY DEHYDROCONDENSATION IN THE PRESENCE OF A METAL CATALYST BLUESTAR SILICONES FRANCE (FR) 2012-07-05 US disclosed
US-8207245-B2 Gels AORTECH INTERNATIONAL PLC (GB) 2012-06-26 US disclosed
CN-1981069-B Composition containing siloxane compound and phenol compound ADEKA CORP 2010-09-08 CN disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-20100029802-A1 Gels AORTECH INTERNATIONAL PLC (GB) 2010-02-04 US disclosed
US-20080293844-A1 Gels AORTECH BIOMATERIALS PTY LTD (AU) 2008-11-27 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed
CN-1981069-A Composition containing siloxane compound and phenol compound ADEKA CORP (JP) 2007-06-13 CN disclosed