⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11778153 | 0.60 | — | — | |
| SCHEMBL17474541 | 0.57 | — | — | |
| SCHEMBL3680386 | 0.57 | — | — | |
| SCHEMBL253040 | 0.56 | — | — | |
| SCHEMBL3749483 | 0.54 | — | — | |
| SCHEMBL7576919 | 0.52 | — | — | |
| SCHEMBL19547296 | 0.52 | — | — | |
| SCHEMBL16139483 | 0.45 | — | — | |
| SCHEMBL15310048 | 0.45 | — | — | |
| SCHEMBL31346761 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1981069-B | Composition containing siloxane compound and phenol compound | ADEKA CORP | 2010-09-08 | — | — | CN | disclosed |
| US-7737291-B2 | 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition | ADEKA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20070232821-A1 | Composition Containing Siloxane Compound and Phenol Compound | ADEKA CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| CN-1981069-A | Composition containing siloxane compound and phenol compound | ADEKA CORP (JP) | 2007-06-13 | — | — | CN | disclosed |