SCHEMBL3684757

SCHEMBL3684757

C[SiH](O[SiH3])O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15021794 0.94
SCHEMBL15227901 0.84
SCHEMBL510967 0.83
SCHEMBL12203062 0.80
SCHEMBL12168720 0.80
SCHEMBL12168711 0.80
SCHEMBL12015642 0.80
SCHEMBL2107500 0.80
SCHEMBL3870741 0.80
SCHEMBL41518 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115584491-A Organoaminopolysiloxanes for deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2023-01-10 CN claimed
CN-110462097-B Organoaminopolysiloxanes for deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2022-11-15 CN claimed
EP-0378123-B1 Ionic conductive polymer electrolyte and cell comprising the same HITACHI MAXELL (JP) 1996-09-11 EP claimed
US-12516229-B2 Printable silicone composition and methods for its preparation and use DOW SILICONES CORPORATION (US) 2026-01-06 US disclosed
CN-118317992-A Dual UV blocker comprising a shelf-life stable photoactive bulk polymerized polycycloolefin composition as an optical material 普罗米鲁斯有限责任公司 2024-07-09 CN disclosed
US-20230407012-A1 PRINTABLE SILICONE COMPOSITION AND METHODS FOR ITS PREPARATION AND USE DOW SILICONES CORPORATION 2023-12-21 US disclosed
CN-115584491-A Organoaminopolysiloxanes for deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2023-01-10 CN disclosed
US-10810951-B2 Electrowetting cells with high transmissivity fluids ABL IP HOLDING LLC (US) 2020-10-20 US disclosed
US-20190244574-A1 ELECTROWETTING CELLS WITH HIGH TRANSMISSIVITY FLUIDS ABL IP HOLDING LLC 2019-08-08 US disclosed
US-9102814-B2 Polyhydroxy curable fluoroelastomer compositions THE CHEMOURS COMPANY FC, LLC (US) 2015-08-11 US disclosed
CN-102584883-B Multi-silicon methacrylate and acrylate monomer and synthetic method HUBEI GURUN TECHNOLOGY CO LTD 2014-06-04 CN disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-7611996-B2 Multi-stage curing of low K nano-porous films APPLIED MATERIALS, INC. (US) 2009-11-03 US disclosed
US-7601631-B2 Very low dielectric constant plasma-enhanced CVD films APPPLIED MATERIALS, INC. (US) 2009-10-13 US disclosed
US-7327524-B2 Electrowetting module KONINKLIJKE PHILIPS ELECTRONICS N.V. (NL) 2008-02-05 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed
CN-1981069-A Composition containing siloxane compound and phenol compound ADEKA CORP (JP) 2007-06-13 CN disclosed
US-20060215274-A1 Electrowetting module KONINKLIJKE PHILIPS ELECTRONICS N.V. 2006-09-28 US disclosed
CN-1656150-A High fracture toughness hydrosilylation cured silicone resins MASSACHUSETTS INST TECHNOLOGY (US) 2005-08-17 CN disclosed
US-4177322-A ENCAPPED POLYSILOXANE DOW CORNING CORPORATION (US) 1979-12-04 US disclosed