SCHEMBL370129

SCHEMBL370129

O=C(O)c1ccc(C(=O)c2ccccc2)c(C(=O)O)c1

nearest known ligand 0.85

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.85
CDC25B P30305 2/20 0.75
HSD17B10 Q99714 2/20 0.75
CDC25A P30304 1/20 0.75
AKR1C3 P42330 3/20 0.67
CYP2C8 P10632 1/20 0.61
CYP2C9 P11712 1/20 0.61
SRD5A2 P31213 1/20 0.59
ATM Q13315 1/20 0.58
POLB P06746 3/20 0.57
TDP1 Q9NUW8 2/20 0.56
NR4A1 P22736 1/20 0.56
L3MBTL1 Q9Y468 1/20 0.56
MEN1 O00255 1/20 0.52
USP2 O75604 1/20 0.52
GAA P10253 1/20 0.52
KMT2A Q03164 1/20 0.52
KEAP1 Q14145 1/20 0.52
NFE2L2 Q16236 1/20 0.52
ALDH1A1 P00352 2/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29941267 0.94 KDM4E (0.89) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL28427727 0.94 KDM4E (0.89) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL8442329 0.92 KDM4E (1.00) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL4649748 0.88 CDC25B (0.81) KDM4ECDC25BHSD17B10CDC25AAKR1C3
Benzophenone SCHEMBL8946163 0.86 CDC25B (0.78) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL1295856 0.86 CDC25B (0.78) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL3074652 0.86 CDC25B (1.00) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL2058645 0.86 CDC25B (1.00) KDM4ECDC25BHSD17B10CDC25AAKR1C3
SCHEMBL9727342 0.85 KDM4E (0.74) KDM4ECDC25BHSD17B10CDC25AAKR1C3
Phthalic Acid SCHEMBL20678581 0.85 CDC25B (0.77) KDM4ECDC25BHSD17B10CDC25AAKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116813926-A Triazole trinuclear cobalt cluster coordination polymer and preparation method and application thereof 广东工业大学 2023-09-29 CN claimed
CN-112322021-A Polyurethane antibacterial material for 3D printing, preparation method and application 四川墨分三维科技有限公司 2021-02-05 CN claimed
CN-111848654-A Zinc complex with property of catalyzing photo-degradation of methyl orange dye and preparation method thereof 盐城师范学院 2020-10-30 CN claimed
CN-110655747-A High-strength high-heat-resistance diatomite modified acrylate microsphere composite material and preparation method thereof 合肥杰事杰新材料股份有限公司 2020-01-07 CN claimed
CN-110655727-A Wear-resistant diatomite modified polystyrene microsphere composite material and preparation method thereof 合肥杰事杰新材料股份有限公司 2020-01-07 CN claimed
CN-110066486-A A kind of high intensity wear-resistant acrylate microspheres and preparation method thereof 合肥杰事杰新材料股份有限公司 2019-07-30 CN claimed
CN-109423039-A A kind of high-strength nylon microballoon composite material and preparation method 合肥杰事杰新材料股份有限公司 2019-03-05 CN claimed
CN-109135152-A A kind of carbon fiber ball modified light-sensitive resin composite materials and preparation method thereof 合肥杰事杰新材料股份有限公司 2019-01-04 CN claimed
CN-103772877-B A kind of polystyrene microsphere modified light-sensitive resin and preparation method thereof for 3D printing 合肥杰事杰新材料股份有限公司 2018-09-28 CN claimed
CN-103772838-B A kind of hydrotalcite-modified polystyrene microsphere material and preparation method and its application in 3D printing 合肥杰事杰新材料股份有限公司 2018-09-28 CN claimed
CN-104250436-A Nylon microsphere modified photosensitive resin, its preparation method, and its application in 3D printing HEFEI GENIUS NEW MAT CO LTD 2014-12-31 CN claimed
US-20140336300-A1 HIGH DIMENSIONAL STABILITY POLYESTER COMPOSITIONS INVISTA NORTH AMERICA S.A R.L. (DE) 2014-11-13 US claimed
CN-103772870-A Acrylic ester microsphere modified material, and preparation method and application thereof to 3D printing HEFEI GENIUS NEW MAT CO LTD 2014-05-07 CN claimed
CN-103772837-A Polystyrene microsphere material for 3D (three dimensional) printing and preparation method thereof HEFEI GENIUS NEW MAT CO LTD 2014-05-07 CN claimed
CN-103772877-A Polystyrene microsphere modified photosensitive resin for 3D printing and preparation method thereof HEFEI GENIUS NEW MAT CO LTD 2014-05-07 CN claimed
CN-103772838-A Hydrotalcite modified polystyrene microsphere material as well as preparation method and application thereof in 3D (Three-dimensional) printing HEFEI GENIUS NEW MAT CO LTD 2014-05-07 CN claimed
EP-2593513-A2 HIGH DIMENSIONAL STABILITY POLYESTER COMPOSITIONS Invista Technologies S.a r.l. (CH) 2013-05-22 EP claimed
WO-2012009201-A2 HIGH DIMENSIONAL STABILITY POLYESTER COMPOSITIONS INVISTA TECHNOLOGIES S.A R.L. (CH) 2012-01-19 WO claimed
CN-101805448-A Polybenzimidazole containing phenylsulfonyl side groups and preparation method thereof UNIV SHANGHAI JIAOTONG 2010-08-18 CN claimed
US-4342700-A SALTS OF SUBSTITUTED ANTHRAQUINONESULFONIC ACID MITSUI TOATSU CHEMICALS, INC. (JP) 1982-08-03 US claimed