SCHEMBL370876

SCHEMBL370876

B.[La]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28246048 0.82
SCHEMBL28188534 0.82
SCHEMBL27960564 0.82
Methane SCHEMBL28493103 0.82
SCHEMBL28980680 0.82
SCHEMBL27860881 0.82
SCHEMBL18318003 0.82
SCHEMBL27958837 0.82
SCHEMBL28359292 0.82
SCHEMBL28668043 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119930877-A Preparation method of heat-insulating PVB resin powder and heat-insulating PVB film 四川东材新材料有限责任公司 2025-05-06 CN claimed
WO-2024191906-A1 HIGH TEMPERATURE SUPERCONDUCTIVITY COMPOSITE MATERIALS AND METHODS OF MAKING THE SAME EMPLOYING CONFINEMENT AND STRAIN TO STABILIZE HIGH PRESSURE TRANSITIONS YALE UNIVERSITY (US) 2024-09-19 WO claimed
CN-104910914-B Lanthanum boron vanadate-based red fluorescent material and preparation method thereof 江苏师范大学 2017-05-24 CN claimed
CN-106191490-A A kind of cast Al-Si alloy aluminum lanthanum boron strontium intermediate alloy and preparation method thereof 东南大学 2016-12-07 CN claimed
CN-104910914-A Lanthanum boron vanadate-based red fluorescent material and preparation method thereof UNIV JIANGSU NORMAL 2015-09-16 CN claimed
US-7648602-B1 Reagents for hypergolic ignition of nitroarenes THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 2010-01-19 US claimed
CN-101586229-A Magnetron sputtering apparatus and film manufacturing method CANON ANELVA CORP (JP) 2009-11-25 CN claimed
CN-101575698-A Magnetron sputtering apparatus and thin film manufacturing method C O CANON ANELVA CORP (JP) 2009-11-11 CN claimed
EP-0526663-A1 LIGHT PROJECTING DEVICE SEIKO EPSON CORPORATION (JP) 1993-02-10 EP claimed
CN-121931590-A Growth method of ultraviolet nonlinear optical crystal 中国科学院福建物质结构研究所 2026-04-28 CN disclosed
CN-119874188-A High-hardness high-toughness high-refraction lanthanum aluminate glass and preparation method and application thereof 齐鲁工业大学(山东省科学院) 2025-04-25 CN disclosed
CN-119028790-A Cathode assembly and driving method thereof 材料科学姑苏实验室 2024-11-26 CN disclosed
CN-118666497-A Lanthanide series microcrystalline glass and preparation method thereof 中国电子科技集团公司第四十三研究所 2024-09-20 CN disclosed
WO-2024191906-A1 HIGH TEMPERATURE SUPERCONDUCTIVITY COMPOSITE MATERIALS AND METHODS OF MAKING THE SAME EMPLOYING CONFINEMENT AND STRAIN TO STABILIZE HIGH PRESSURE TRANSITIONS YALE UNIVERSITY (US) 2024-09-19 WO disclosed
EP-0606491-A4 TUNGSTEN ELECTRODE MATERIAL. TOHO KINZOKU KK (JP) 1994-05-20 EP disclosed
WO-1994003650-A1 TUNGSTEN ELECTRODE MATERIAL TOHO KINZOKU CO., LTD. (JP) 1994-02-17 WO disclosed
EP-0526663-A1 LIGHT PROJECTING DEVICE SEIKO EPSON CORPORATION (JP) 1993-02-10 EP disclosed
EP-0518633-A1 Pattern inspection apparatus and electron beam apparatus FUJITSU LIMITED (JP) 1992-12-16 EP disclosed
US-4873349-A Ruthenium catalyst for biarylic coupling; new steganolides UNIVERSITE DU MAINE (LE MANS) (FR) 1989-10-10 US disclosed
US-4800459-A CAPACITORS MURATA MANUFACTURING CO., LTD. (JP) 1989-01-24 US disclosed