⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5666260 | 0.96 | — | — | |
| SCHEMBL4445189 | 0.79 | USP2 (0.54) | — | |
| SCHEMBL28116493 | 0.75 | USP2 (0.50) | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL28282450 | 0.75 | — | — | |
| SCHEMBL250275 | 0.72 | — | — | |
| SCHEMBL3132107 | 0.72 | USP2 (0.47) | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL573583 | 0.70 | — | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL63290 | 0.70 | — | — | |
| Methanesulfonic Acid Methyl Ester SCHEMBL16060132 | 0.70 | USP2 (1.00) | — | |
| SCHEMBL25250203 | 0.69 | USP2 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014014472-A1 | STARCH-BASED ADHESIVES | EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) | 2014-01-23 | — | — | WO | claimed |
| EP-0931083-A4 | PROCESS FOR PRODUCING ECTEINASCIDIN COMPOUNDS | HARVARD COLLEGE (US) | 2000-05-24 | — | — | EP | claimed |
| EP-0931083-A1 | PROCESS FOR PRODUCING ECTEINASCIDIN COMPOUNDS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 1999-07-28 | — | — | EP | claimed |
| WO-1998012198-A1 | PROCESS FOR PRODUCING ECTEINASCIDIN COMPOUNDS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 1998-03-26 | — | — | WO | claimed |
| US-20250270185-A1 | METHOD FOR PREPARATION OF IPTACOPAN HYDROCHLORIDE | HANGZHOU CHEMINSPIRE TECHNOLOGIES CO., LTD. (CN) | 2025-08-28 | — | — | US | disclosed |
| EP-4269120-A1 | ORIGINAL PLATE FOR PLANOGRAPHIC PRINTING PLATE, METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE, PRINTING METHOD, AND METHOD FOR MANUFACTURING ALUMINUM SUPPORT | FUJIFILM Corporation (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-20210253607-A1 | ORGANOSILANES FOR THE TREATMENT OF INFECTIONS | TOPIKOS PHARMACEUTICALS, INC. (US) | 2021-08-19 | — | — | US | disclosed |
| EP-3476616-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MANUFACTURING A LITHOGRAPHIC PRINTING PLATE, AND PRINTING METHOD | FUJIFILM CORP (JP) | 2021-07-14 | — | — | EP | disclosed |
| US-10875346-B2 | Lithographic printing plate precursor, lithographic printing plate manufacturing method and printing method | FUJIFILM CORPORATION (JP) | 2020-12-29 | — | — | US | disclosed |
| US-20200223215-A1 | PRINTING PLATE PRECURSOR, METHOD OF PRODUCING PRINTING PLATE, AND PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2020-07-16 | — | — | US | disclosed |
| WO-2020109264-A1 | COSMETIC COMPOSITION COMPRISING SPECIFIC HYPERBRANCHED COPOLYMERS AND ANIONIC EMULSIFIERS | DSM IP ASSETS B.V. (NL) | 2020-06-04 | — | — | WO | disclosed |
| US-20190192405-A1 | DEEP CLEANSING HAIR CARE COMPOSITION | PROCTER & GAMBLE (US) | 2019-06-27 | — | — | US | disclosed |
| WO-2010099223-A1 | LYOTROPIC LIQUID CRYSTAL SYSTEMS BASED ON AROMATIC TETRACARBOXYLIC BISBENZOIMIDAZOLE DERIVATIVES AND METHODS FOR MAKING | NITTO DENKO CORPORATION (JP) | 2010-09-02 | — | — | WO | disclosed |
| CN-1803964-A | Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1243071-C | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2006-02-22 | — | — | CN | disclosed |
| CN-1699349-A | Method and reagents for N-alkylating ureides | TARO PHARMA IND (IL) | 2005-11-23 | — | — | CN | disclosed |
| CN-1158694-C | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | �������ɹ�ҵ��ʽ���� | 2004-07-21 | — | — | CN | disclosed |
| CN-1392215-A | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2003-01-22 | — | — | CN | disclosed |
| CN-1334961-A | Metal polishing liquid material, metal polishing liquid, method for producing same, and polishing method using same | HITACHI CHEMICAL CO LTD (JP) | 2002-02-06 | — | — | CN | disclosed |
| CN-1273581-A | Process and reagent for N-alkylation of ureides | TARO PHARMA IND (IL) | 2000-11-15 | — | — | CN | disclosed |