Fluoride

Fluoride

SCHEMBL372355

F.F.[NaH]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL29203898 1.00
Fluoride SCHEMBL5706468 1.00
Fluoride SCHEMBL4246866 1.00
Fluoride SCHEMBL35954 1.00
Fluoride SCHEMBL21629483 1.00
Fluoride SCHEMBL21629484 1.00
Fluoride SCHEMBL9116839 1.00
Fluoride SCHEMBL16694049 1.00
Fluoride SCHEMBL9244503 1.00
Fluoride SCHEMBL28698758 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2481 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260146336-A1 METHOD FOR THE ANTI-CORROSION TREATMENT OF A MAGNESIUM ALLOY PART, CORRESPONDING ANTI-CORROSION SUBSTANCE AND TREATED PART AIRBUS HELICOPTERS (FR) 2026-05-28 US claimed
CN-122035785-A Method and system for recycling regenerated electrolyte 中铝郑州有色金属研究院有限公司 2026-05-15 CN claimed
US-20260132335-A1 ETCHANT COMPOSITIONS FOR ETCHING SILICON GERMANIUM FILMS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-05-14 US claimed
US-12624287-B2 Composition for the selective etching of silicon ENF TECHNOLOGY CO., LTD. (KR) 2026-05-12 US claimed
US-12492340-B2 Etchant SAMSUNG DISPLAY CO., LTD. (KR) 2025-12-09 US claimed
US-20250361442-A1 ETCHANT COMPOSITION DONGJIN SEMICHEM CO LTD (KR) 2025-11-27 US claimed
US-20250346812-A1 COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON ENF TECHNOLOGY CO LTD (KR) 2025-11-13 US claimed
US-12415955-B2 Etchant composition for silicon layer and etching method using the same ENF TECHNOLOGY CO., LTD. (KR) 2025-09-16 US claimed
US-12404207-B2 Textured, antiglare glass articles and methods of making the same CORNING INCORPORATED (US) 2025-09-02 US claimed
US-12384967-B2 Etchant SAMSUNG DISPLAY CO., LTD. (KR) 2025-08-12 US claimed
US-4351675-A OXIDATION, HYDROXYALKYLENEDIPHOSPHONIC ACID ROHCO, INC. (US) 1982-09-28 US claimed
US-4299804-A Removal of magnesium and aluminum impurities from wet process phosphoric acid AGRICO CHEMICAL COMPANY (US) 1981-11-10 US claimed
EP-0020021-A2 Method for the direct electrodeposition of a chromium layer on a metal substrate and a lithographic sheet comprising a metal substrate covered with such an electrodeposited chromium layer PRINTING DEVELOPMENTS INC (US) 1980-12-10 EP claimed
US-4160811-A METATHESIS, SODIUM FLUORIDES, HYDROFLUORIC ACID, TETRAFLUOROAMMONIUM HEXAFLUORO(GROUP 5)METALLOID TRW INC. (US) 1979-07-10 US claimed
EP-0002380-A1 Laundering process for dual-bleaching stained fabrics BASF WYANDOTTE CORPORATION (US) 1979-06-13 EP claimed
US-4144315-A REACTING FLUOSILICIC ACID WITH AMMONIA GOULDING CHEMICALS LIMITED (IE) 1979-03-13 US claimed
US-4120650-A Laundering process for dual bleaching stained fabrics BASF WYANDOTTE CORPORATION (US) 1978-10-17 US claimed
US-4089936-A HEATING AMMONIUM FLUORIDE WITH POTASSIUM FLUORIDE, CONVERSION TO SODIUM BIFLUORIDE, DECOMPOSITION GOULDING CHEMICALS LIMITED (EI) 1978-05-16 US claimed
US-4073701-A ACETANILIDE OXIDATION INHIBITING AGENT BETHLEHEM STEEL CORPORATION (US) 1978-02-14 US claimed
US-4067957-A Process for producing hydrogen fluoride from an aqueous hydrofluorosilicic acid solution FITZWILTON LIMITED (EI) 1978-01-10 US claimed