⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35391 | 0.96 | — | — | |
| SCHEMBL28301740 | 0.96 | TDP1 (0.50) | — | |
| SCHEMBL28264071 | 0.92 | — | — | |
| Ethylene SCHEMBL28308305 | 0.92 | — | — | |
| Ammonia Solution, Strong SCHEMBL28407677 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL6853921 | 0.92 | — | — | |
| SCHEMBL11143428 | 0.92 | — | — | |
| Water SCHEMBL18983441 | 0.92 | — | — | |
| Methacrylic Acid SCHEMBL11401194 | 0.86 | TDP1 (0.42) | — | |
| SCHEMBL29036811 | 0.86 | TDP1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114044843-A | Photoresist resin and preparation method and application thereof | 宁波南大光电材料有限公司 | 2022-02-15 | — | — | CN | disclosed |
| US-7829644-B2 | Gel-forming reagents and uses thereof for preparing microarrays | UCHICAGO ARGONNE, LLC (US) | 2010-11-09 | — | — | US | disclosed |
| US-20070249797-A1 | GEL-FORMING REAGENTS AND USES THEREOF FOR PREPARING MICROARRAYS | UCHICAGO ARGONNE LLC (US) | 2007-10-25 | — | — | US | disclosed |