SCHEMBL37441

SCHEMBL37441

CCCCC(CC)OCCO

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.43
ALDH1A1 P00352 4/20 0.41
PRKCA P17252 1/20 0.39
PRKCD Q05655 1/20 0.39
MEN1 O00255 1/20 0.39
THRB P10828 1/20 0.39
HTT P42858 1/20 0.39
KMT2A Q03164 1/20 0.39
MAPT P10636 1/20 0.39
CNR1 P21554 1/20 0.37
CNR2 P34972 1/20 0.37
DNM1 Q05193 1/20 0.36
CA2 P00918 2/20 0.35
CA1 P00915 1/20 0.35
CTSK P43235 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MAPK1 P28482 1/20 0.34
LMNA P02545 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12599352 1.00 TSHR (0.43) TSHRALDH1A1PRKCAPRKCDMEN1
SCHEMBL24024 0.94 MEN1 (0.42) TSHRALDH1A1PRKCAPRKCDMEN1
SCHEMBL30977035 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL490568 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL30977036 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL30977025 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL30977021 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL30977008 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL2462447 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT
SCHEMBL30977028 0.92 MEN1 (0.45) TSHRALDH1A1MEN1THRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101768166-A Preparation method of 3,4-alkyl dioxythiophene ZHANGJIAGANG HUASHENG CHEMICAL 2010-07-07 CN claimed
US-7025818-B2 Ink for ink jet recording and ink jet recording process FUJI PHOTO FILM CO., LTD. (JP) 2006-04-11 US claimed
WO-2024142790-A1 WATER REPELLENT OIL REPELLENT COMPOSITION, AND WATER REPELLENT OIL REPELLENT FIBER PRODUCT AND METHOD FOR PRODUCING SAME 日華化学株式会社 2024-07-04 WO disclosed
CN-113891901-B Coating material 汉高股份有限及两合公司 2024-06-14 CN disclosed
WO-2024090423-A1 (METH)ACRYLATE-CONTAINING COMPOSITION 株式会社日本触媒 2024-05-02 WO disclosed
US-20240067903-A1 LIQUID ANTIADHESIVE COMPOSITION FOR UNVULCANIZED RUBBER, WATER-DILUTED LIQUID ANTIADHESIVE COMPOSITION SOLUTION FOR UNVULCANIZED RUBBER, AND UNVULCANIZED RUBBER LION SPECIALTY CHEMICALS CO., LTD. (JP) 2024-02-29 US disclosed
EP-3976880-B1 COATING MATERIAL HENKEL AG & CO KGAA (DE) 2024-01-03 EP disclosed
CN-113227486-B Water repellent composition and method for producing water repellent fiber product 日华化学株式会社 2024-01-02 CN disclosed
CN-112955519-B Waterproof agent composition, waterproof fiber product, and method for producing waterproof fiber product 日华化学株式会社 2023-09-29 CN disclosed
US-20230203279-A1 ADHESION PREVENTIVE AGENT FOR UNVULCANIZED RUBBER AND AQUEOUS DISPERSION OF ADHESION PREVENTIVE AGENT FOR UNVULCANIZED RUBBER LION SPECIALTY CHEMICALS CO., LTD. (JP) 2023-06-29 US disclosed
WO-2023112914-A1 Coating Agent for Paper Base Material HENKEL AG & CO. KGAA (DE) 2023-06-22 WO disclosed
CN-1656639-A Fuel cell-use liquid fuel and fuel cell using this, and application method for fuel cell using this NIPPON ELECTRIC CO (JP) 2005-08-17 CN disclosed
US-6797452-B2 DISSOLVED IN HIGH-BOILING SOLVENT HAVING LOW TOXICITY (PROPYLENE GLYCOL); CAN BE DEVELOPED WITH WATER WITHOUT AFFECTING STRONG ADHESION; SCREEN PRINTING; BLADE COATING TOYO GOSEI KOGYO CO., LTD. (JP) 2004-09-28 US disclosed
US-20040055508-A1 Ink for ink jet recording and ink jet recording process FUJI PHOTO FILM CO., LTD. 2004-03-25 US disclosed
EP-1378550-A1 Ink for ink jet recording and ink jet recording process FUJI PHOTO FILM CO., LTD. (JP) 2004-01-07 EP disclosed
US-20030022104-A1 Photosensitive composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition TOYO GOSEI KOGYO CO., LTD. (JP) 2003-01-30 US disclosed
US-20020023384-A1 Low pollution fuel HAMADA YOSHIRO (JP) 2002-02-28 US disclosed
EP-1178101-A2 Low pollution fuel Hamada, Yoshiro (JP) 2002-02-06 EP disclosed
EP-1058154-A1 Composition comprising photosensitive saponified poly(vinyl acetate) and pattern formation method making use of the composition Toyo Gosei Kogyo Co., Ltd. (JP) 2000-12-06 EP disclosed
US-5177161-A BINDERS, THEIR PREPARATION AND USE IN CURABLE MIXTURES HOECHST AG (DE) 1993-01-05 US disclosed