SCHEMBL3751182

SCHEMBL3751182

CC(=O)OC(C)CC(C)O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.52
CHRM2 P08172 2/20 0.52
CHRM4 P08173 2/20 0.52
CHRM1 P11229 2/20 0.52
TBXA2R P21731 1/20 0.52
SMN1; SMN2 Q16637 2/20 0.50
GALR3 O60755 1/20 0.50
MAPT P10636 1/20 0.50
BLM P54132 1/20 0.50
ALOX15 P16050 1/20 0.38
CYP19A1 P11511 1/20 0.35
TDP1 Q9NUW8 3/20 0.34
TRPV1 Q8NER1 1/20 0.34
LMNA P02545 3/20 0.31
MEN1 O00255 1/20 0.31
CYP1A2 P05177 1/20 0.31
HRH1 P35367 1/20 0.31
KMT2A Q03164 1/20 0.31
CHRM5 P08912 1/20 0.31
CHRM3 P20309 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17427809 0.89 CHRM1 (0.47) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL10331178 0.87 TSHR (0.58) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL14087827 0.84 TSHR (0.56) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL766233 0.84 TSHR (0.56) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL8731030 0.82 CYP19A1 (0.36) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL2721210 0.80 CYP19A1 (0.35) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL820672 0.79 TSHR (0.47) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL9511056 0.78 TSHR (0.50) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL17358635 0.78 TSHR (0.50) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL3373149 0.78 CHRM2 (0.54) TSHRCHRM2CHRM4CHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109313388-B Negative photosensitive composition 住友电木株式会社 2022-06-21 CN claimed
CN-112771447-B Positive photosensitive resin composition, photosensitive resin film using the same, and electronic device 三星SDI株式会社 2025-06-03 CN disclosed
CN-112689800-B Photosensitive resin composition for forming permanent film, cured film, electronic device, and method for producing same 住友电木株式会社 2024-07-30 CN disclosed
CN-113811556-B Photosensitive resin composition, resin film and electronic device 住友电木株式会社 2024-05-28 CN disclosed
CN-116848467-A Photosensitive resin composition, cured film, and semiconductor device 住友电木株式会社 2023-10-03 CN disclosed
CN-110967928-B Positive photosensitive resin composition, photosensitive resin layer, and electronic device 三星SDI株式会社 2023-08-01 CN disclosed
US-20230220613-A1 WATER SOLUBLE FIBERS WITH POST PROCESS MODIFICATIONS AND ARTICLES CONTAINING SAME MONOSOL, LLC (US) 2023-07-13 US disclosed
US-20230203748-A1 WATER SOLUBLE FIBERS WITH POST PROCESS MODIFICATIONS AND ARTICLES CONTAINING SAME MONOSOL, LLC (US) 2023-06-29 US disclosed
CN-110501874-B Photosensitive resin composition, photosensitive resin layer, and electronic device 三星SDI株式会社 2023-05-16 CN disclosed
CN-110501877-B Photosensitive resin composition, photosensitive resin layer using same, and electronic device 三星SDI株式会社 2023-04-25 CN disclosed
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
CN-101109899-B Resist composition DAICEL CHEM 2011-08-17 CN disclosed
US-20100289100-A1 SOLID-STATE IMAGE PICKUP DEVICE, METHOD OF MANUFACTURING SOLID-STATE IMAGE PICKUP DEVICE, AND ELECTRONIC APPARATUS SONY CORPORATION (JP) 2010-11-18 US disclosed
US-20100098878-A1 INK-JET INK AND INK-JET RECORDING METHOD KONICA MINOLTA HOLDINGS, INC. (JP) 2010-04-22 US disclosed
US-7588330-B2 Ink-jet recording method KONICA MINOLTA HOLDINGS, INC. (JP) 2009-09-15 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
CN-101109899-A Resist composition DAICEL CHEM (JP) 2008-01-23 CN disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed
US-20070120881-A1 INK-JET RECORDING METHOD KONICA MINOLTA HOLDINGS, INC. (JP) 2007-05-31 US disclosed
US-20070115325-A1 INK-JET INK AND INK-JET RECORDING METHOD KONICA MINOLTA HOLDINGS, INC. (JP) 2007-05-24 US disclosed