SCHEMBL3751526

SCHEMBL3751526

CCCCCCCCCCCC[SiH2]OC

nearest known ligand 0.44

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.44
THRB P10828 1/20 0.44
DNM1 Q05193 7/20 0.35
ALDH1A1 P00352 3/20 0.35
LMNA P02545 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 1/20 0.35
SLC22A1 O15245 1/20 0.35
EPHX1 P07099 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL613294 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2367729 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL3173904 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL19385575 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL8355145 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL441896 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL7789575 1.00
SCHEMBL17991922 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL20636855 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL28027338 1.00 TSHR (0.44) TSHRTHRBDNM1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118762871-B Fireproof short-circuit-proof anti-aging wire and cable 浙江欧普线缆有限公司 2025-03-28 CN claimed
CN-118762871-A Fireproof short-circuit-proof anti-aging wire and cable 浙江欧普线缆有限公司 2024-10-11 CN claimed
CN-118046635-A Novel composite waterproof material and preparation method thereof 东营市沃格艾迪石油技术有限公司 2024-05-17 CN claimed
CN-116277323-A Preparation method of high-moisture-proof bamboo shaving board 点金新型材料研究院(厦门)有限公司 2023-06-23 CN claimed
CN-109129780-A A kind of preparation method of paraffin/silane waterproofing agent 太仓欧典新材料有限公司 2019-01-04 CN claimed
CN-118762871-B Fireproof short-circuit-proof anti-aging wire and cable 浙江欧普线缆有限公司 2025-03-28 CN disclosed
CN-119425407-A Super-hydrophobic polymeric membrane and preparation method and application thereof 江苏扬农化工集团有限公司 2025-02-14 CN disclosed
CN-119263677-A Self-dispersion nano silicon dioxide particles for cement-based material and preparation method thereof 河南理工大学 2025-01-07 CN disclosed
CN-118762871-A Fireproof short-circuit-proof anti-aging wire and cable 浙江欧普线缆有限公司 2024-10-11 CN disclosed
WO-2024190566-A1 SEALING FILM AND PRODUCTION METHOD FOR SAME AND ELECTRONIC COMPONENT DEVICE AND PRODUCTION METHOD FOR SAME 株式会社レゾナック 2024-09-19 WO disclosed
CN-118415958-A Preparation and application of AS-PNS nanocrystalline-loaded soluble microneedle for scar repair 西南大学 2024-08-02 CN disclosed
CN-112071998-B Light-emitting device and display device 京东方科技集团股份有限公司 2024-06-11 CN disclosed
US-20160216608-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE AND METHOD FOR FORMING RESIST PATTERN HITACHI CHEMICAL COMPANY, LTD (JP) 2016-07-28 US disclosed
US-9235121-B2 Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-01-12 US disclosed
US-20140251676-A1 STRUCTURE CONTAINING CONDUCTOR CIRCUIT, METHOD FOR MANUFACTURING SAME, AND HEAT-CURABLE RESIN COMPOSITION HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-09-11 US disclosed
US-20140154628-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, PERMANENT RESIST AND METHOD FOR PRODUCING PERMANENT RESIST RESONAC CORPORATION (JP) 2014-06-05 US disclosed
CN-101471414-B Process for producing light-emitting semiconductor device TOSHIBA CORP 2010-12-08 CN disclosed
US-7838311-B2 Process for producing light-emitting semiconductor device KABUSHIKI KAISHA TOSHIBA (JP) 2010-11-23 US disclosed
US-20090176323-A1 PROCESS FOR PRODUCING LIGHT-EMITTING SEMICONDUCTOR DEVICE KABUSHIKI KAISHA TOSHIBA (JP) 2009-07-09 US disclosed
CN-101471414-A Process for producing light-emitting semiconductor device TOSHIBA KK (JP) 2009-07-01 CN disclosed