Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL3755403

ClCC=Cc1ccccc1.N

nearest known ligand 0.50

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Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.50
PAM P19021 1/20 0.50
MAOB P27338 2/20 0.48
HTR2A P28223 3/20 0.47
CYP11B1 P15538 1/20 0.41
CYP11B2 P19099 1/20 0.41
SIGMAR1 Q99720 2/20 0.41
NPC1 O15118 1/20 0.41
RAB9A P51151 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9044783 0.97 IDO1 (0.52) IDO1PAMMAOBHTR2ACYP11B1
SCHEMBL39674 0.97 IDO1 (0.52) IDO1PAMMAOBHTR2ACYP11B1
SCHEMBL15852 0.97 IDO1 (0.52) IDO1PAMMAOBHTR2ACYP11B1
Benzene SCHEMBL1225975 0.97 IDO1 (0.52) IDO1PAMMAOBHTR2ACYP11B1
Benzene SCHEMBL1225972 0.97 IDO1 (0.52) IDO1PAMMAOBHTR2ACYP11B1
SCHEMBL27703701 0.95 IDO1 (0.50) IDO1PAMMAOBHTR2ACYP11B1
Fluoride SCHEMBL27261594 0.95 IDO1 (0.50) IDO1PAMMAOBHTR2ACYP11B1
SCHEMBL16162329 0.95 IDO1 (0.50) IDO1PAMMAOBHTR2ACYP11B1
SCHEMBL16162331 0.95 IDO1 (0.50) IDO1PAMMAOBHTR2ACYP11B1
SCHEMBL10880315 0.87 IDO1 (0.44) IDO1PAMMAOBHTR2ASIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2258732-A1 Method of manufacture polyelectrolyte Sony Corporation (JP) 2010-12-08 EP disclosed
EP-1505086-B1 Method of manufacturing polyelectrolyte SONY CORP (JP) 2009-02-11 EP disclosed
EP-1803746-A2 Method of manufacturing polyelectrolyte Sony Corporation (JP) 2007-07-04 EP disclosed
EP-1505086-A1 Method of manufacturing polyelectrolyte SONY CORPORATION (JP) 2005-02-09 EP disclosed
EP-0818474-B1 Method of manufacture polyelectrolyte SONY CORP (JP) 2005-01-12 EP disclosed
EP-1457503-A2 Method of manufacture polyelectrolyte SONY CORPORATION (JP) 2004-09-15 EP disclosed
EP-1457504-A2 Method of manufacture polyelectrolyte SONY CORPORATION (JP) 2004-09-15 EP disclosed
US-20040054093-A1 Method of manufacturing polyelectrolyte INAGAKI YASUHITO (JP) 2004-03-18 US disclosed
US-6545070-B1 Composition of ionic substituted polystyrene and stabilizer(s) SONY CORPORATION (JP) 2003-04-08 US disclosed
US-6417288-B2 DISSOLVING OR DISPERSING POLYSTYRENE IN ALICYCLIC COMPOUND AS SOLVENT; SULFONATION; FLAME-PROOFING SONY CORPORATION (JP) 2002-07-09 US disclosed
US-20020016419-A1 METHOD OF MANUFACTURING POLYELECTROLYTE DEXERIALS CORPORATION (JP) 2002-02-07 US disclosed
US-6274681-B1 DISSOLVING POLYSTYRENE IN SOLVENT, SULFONATING SONY COPORATION (JP) 2001-08-14 US disclosed
US-6210581-B1 PROCESSING PLASTIC COMPRISING HALOGEN FLAME RETARDANT WITH ACID IN SOLVENT TO INTRODUCE ION GROUP INTO RESIN COMPONENT OF PLASTIC AND TO CONVERT PLASTIC INTO WATER-SOLUBLE POLYMER AND DISSOCIATE HALOGEN FROM PLASTIC; SEPARATION OF FLAME RETARDANT SONY CORPORATION (JP) 2001-04-03 US disclosed
US-6022928-A CROSSLINKED SULFONATED STYRENE-CONJUGATED DIENE COPOLYMER HAVING A WEIGHT AVERAGE MOLECULAR WEIGHT OF 900,000 OR MORE SONY CORPORATION (JP) 2000-02-08 US disclosed
EP-0818474-A2 Method of manufacture polyelectrolyte SONY CORPORATION (JP) 1998-01-14 EP disclosed