SCHEMBL3756883

SCHEMBL3756883

COc1ccc(O[C@H]2O[C@H](COCc3ccccc3)[C@@H](OC(C)=O)[C@H](OCc3ccccc3)[C@@H]2N2C(=O)c3ccccc3C2=O)cc1

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ NT5E P21589 1/20 0.43
▸ CYP3A4 P08684 2/20 0.40
▸ MEN1 O00255 1/20 0.40
▸ TP53 P04637 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ CYP2C9 P11712 1/20 0.40
▸ PTPN1 P18031 6/20 0.40
▸ PTPN2 P17706 3/20 0.40
▸ CDC25B P30305 5/20 0.39
▸ SELP P16109 1/20 0.38
▸ PTPN6 P29350 2/20 0.38
▸ PTPN11 Q06124 2/20 0.38
▸ LMNA P02545 1/20 0.38
▸ MAPT P10636 2/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ CYP2C19 P33261 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27002581 1.00 NT5E (0.43) NT5ECYP3A4MEN1TP53KMT2A
SCHEMBL3756881 1.00 NT5E (0.43) NT5ECYP3A4MEN1TP53KMT2A
SCHEMBL5011497 0.93 CYP3A4 (0.47) CYP3A4MEN1TP53KMT2ACYP2C9
SCHEMBL4178365 0.91 NT5E (0.41) NT5EPTPN1PTPN2CDC25BPTPN6
SCHEMBL4185421 0.91 FGF2 (0.43) NT5ECYP3A4PTPN1PTPN2CDC25B
SCHEMBL17456128 0.90 NT5E (0.48) NT5EKMT2APTPN1PTPN2CDC25B
SCHEMBL17456127 0.90 NT5E (0.48) NT5EKMT2APTPN1PTPN2CDC25B
SCHEMBL6553337 0.89 CYP3A4 (0.41) NT5ECYP3A4MEN1TP53KMT2A
SCHEMBL6553329 0.89 CYP3A4 (0.41) NT5ECYP3A4MEN1TP53KMT2A
SCHEMBL4185420 0.89 PTPN1 (0.43) NT5EPTPN1PTPN2CDC25BPTPN6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10144849-B2 Polishing composition and polishing method using the same FUJIMI INCORPORATED (JP) 2018-12-04 — — US disclosed
US-20100301014-A1 Polishing Composition and Polishing Method Using the Same FUJIMI INCORPORATED (JP) 2010-12-02 — — US disclosed
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