SCHEMBL3760076

SCHEMBL3760076

C=CC(=O)OCCC[N+](C)(C)CC

nearest known ligand 0.61

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.61
HPGD P15428 1/20 0.61
ALDH1A1 P00352 4/20 0.57
CYP3A4 P08684 2/20 0.57
TP53 P04637 3/20 0.47
HIF1A Q16665 3/20 0.47
HSD17B10 Q99714 1/20 0.47
THRB P10828 2/20 0.44
BBOX1 O75936 3/20 0.43
ATM Q13315 1/20 0.41
HCAR2 Q8TDS4 2/20 0.37
DNM1 Q05193 2/20 0.36
HTT P42858 1/20 0.36
KMT2A Q03164 1/20 0.36
HSP90AA1 P07900 1/20 0.35
RAD52 P43351 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5239242 0.98 TSHR (0.59) TSHRHPGDALDH1A1CYP3A4TP53
Bromide SCHEMBL27992109 0.98 TSHR (0.59) TSHRHPGDALDH1A1CYP3A4TP53
Fluoride Ion SCHEMBL28241927 0.98 TSHR (0.59) TSHRHPGDALDH1A1CYP3A4TP53
Iodide SCHEMBL28241946 0.98 TSHR (0.59) TSHRHPGDALDH1A1CYP3A4TP53
Iodide SCHEMBL27992107 0.95 TSHR (0.56) TSHRHPGDALDH1A1CYP3A4TP53
SCHEMBL29662116 0.95 TSHR (0.60) TSHRHPGDALDH1A1CYP3A4TP53
Sulfuric Acid SCHEMBL28088491 0.92 TSHR (0.53) TSHRHPGDALDH1A1CYP3A4TP53
Hydrochloric Acid SCHEMBL31544037 0.92 TSHR (0.61) TSHRHPGDALDH1A1CYP3A4TP53
Bromide SCHEMBL20959689 0.92 TSHR (0.61) TSHRHPGDALDH1A1CYP3A4TP53
SCHEMBL14218278 0.91 TSHR (0.63) TSHRHPGDALDH1A1CYP3A4TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116639782-A Wet type coating room circulating water treatment agent, method for capturing paint and water treatment method 栗田工业(大连)有限公司 2023-08-25 CN disclosed
CN-111247182-B Block copolymer, dispersant, coloring composition, and color filter 大塚化学株式会社 2023-08-22 CN disclosed
CN-111971116-B Dispersant composition, coloring composition and color filter 大塚化学株式会社 2022-06-28 CN disclosed
CN-104812790-B Organopolysiloxane graft polymers 花王株式会社 2019-04-12 CN disclosed
CN-108603069-A Antifouling paint compositions, film and the base material with film 中国涂料株式会社 2018-09-28 CN disclosed
CN-108368383-A Coating composition for forming coating film for reducing frictional resistance, coating film, and substrate with coating film 中国涂料株式会社 2018-08-03 CN disclosed
CN-108368381-A It is used to form coating composition, film and the base material with film of the film for reducing frictional resistance 中国涂料株式会社 2018-08-03 CN disclosed
EP-1980544-B1 Process for producing powder KAO CORP (JP) 2016-11-16 EP disclosed
EP-1693352-B1 SURFACTANT COMPOSITION KAO CORP (JP) 2016-03-23 EP disclosed
CN-104812790-A Organopolysiloxane graft polymer KAO CORP 2015-07-29 CN disclosed
CN-102858826-B Production method for block copolymer and copolymer precursor NIPPON SODA CO 2015-05-20 CN disclosed
CN-102869693-B Novel copolymer NIPPON SODA CO 2015-04-15 CN disclosed
CN-103180354-B Novel copolymer NIPPON SODA CO 2015-02-25 CN disclosed
CN-102958965-B Block copolymer production method and copolymer precursor NIPPON SODA CO 2015-02-25 CN disclosed
CN-102958964-B Copolymer NIPPON SODA CO 2015-02-25 CN disclosed
US-7846876-B2 Surfactant composition KAO CORPORATION (JP) 2010-12-07 US disclosed
US-20080262129-A1 mixing an anionic aromatic compound (sodium p-toluenesulfonate), a cationic surfactant polydiallyldimethylammonium chloride and water to obtain a viscous material and feeding the viscous material heated at the specific temperature to the drying step; less caking; modifying the rheology KAO CORPORATION (JP) 2008-10-23 US disclosed
EP-1980544-A2 Process for producing powder Kao Corporation (JP) 2008-10-15 EP disclosed
US-20080058227-A1 Surfactant Composition KAO CORPORATION (JP) 2008-03-06 US disclosed
EP-1693352-A1 SURFACTANT COMPOSITION Kao Corporation (JP) 2006-08-23 EP disclosed