Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.68 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.68 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.68 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.68 |
| ▸ | TYR | P14679 | 1/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.44 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.43 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.43 |
| ▸ | PGR | P06401 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.43 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.43 |
| ▸ | AR | P10275 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30485781 | 0.89 | TYR (0.61) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL922828 | 0.89 | TYR (0.61) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL10922575 | 0.87 | ESR1 (0.58) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL21632759 | 0.86 | ESR1 (0.56) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL9197019 | 0.86 | ESR1 (0.56) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL21632797 | 0.86 | ESR1 (0.56) | ESR1ESR2PDCD1CD274TYR | |
| Phenol SCHEMBL21194938 | 0.83 | ESR1 (0.80) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL8031145 | 0.83 | ESR1 (0.80) | ESR1ESR2PDCD1CD274TYR | |
| Phenol SCHEMBL12230911 | 0.83 | ESR1 (0.80) | ESR1ESR2PDCD1CD274TYR | |
| SCHEMBL51204 | 0.83 | ESR1 (0.80) | ESR1ESR2PDCD1CD274TYR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102428061-B | Method for producing trisphenols and monoester substituted compounds thereof, and 4-acylaralkylphenol derivative | HONSHU CHEMICAL INDUSTRY Co.,Ltd. (JP) | 2015-09-30 | — | — | CN | claimed |
| EP-2016463-A1 | COMPOSITION FOR POSITIVE TYPE PHOTORESIST AND POSITIVE TYPE PHOTORESIST FILM MANUFACTURED THEREBY | KOLON INDUSTRIES, INC. (KR) | 2009-01-21 | — | — | EP | claimed |
| WO-2007119949-A1 | COMPOSITION FOR POSITIVE TYPE PHOTORESIST AND POSITIVE TYPE PHOTORESIST FILM MANUFACTURED THEREBY | KOLON INDUSTRIES, INC (KR) | 2007-10-25 | — | — | WO | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| CN-114801348-B | Preparation process of high-flame-retardance heat-resistant 22F copper-clad plate | 江门建滔积层板有限公司 | 2023-02-03 | — | — | CN | disclosed |
| CN-111801225-B | Thermosensitive recording medium | 日本制纸株式会社 | 2022-11-08 | — | — | CN | disclosed |
| CN-114801348-A | Preparation process of high-flame-retardance heat-resistant 22F copper-clad plate | 江门建滔积层板有限公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-110799345-B | Tamper-resistant media for thermal printing | 欧米亚国际集团 | 2022-04-19 | — | — | CN | disclosed |
| CN-104211588-B | 4-acylaralkylphenol derivative | 本州化学工业株式会社 | 2017-01-11 | — | — | CN | disclosed |
| CN-102428061-B | Method for producing trisphenols and monoester substituted compounds thereof, and 4-acylaralkylphenol derivative | HONSHU CHEMICAL INDUSTRY Co.,Ltd. (JP) | 2015-09-30 | — | — | CN | disclosed |
| CN-102656207-B | Branched polycarbonate resin and process for producing same | TEIJIN CHEMICALS LTD | 2015-01-14 | — | — | CN | disclosed |
| EP-1644427-A2 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-12 | — | — | EP | disclosed |
| WO-2005007719-A2 | POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| US-20040053160-A1 | Resist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-18 | — | — | US | disclosed |
| US-6672210-B2 | Lithographic printing plate precursor with a graft polymerized hydrophilic layer | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-06 | — | — | US | disclosed |
| US-20030069356-A1 | Phosphorous-containing epoxy resin, flame-retardant highly heat-resistant epoxy resin composition containing the resin, and laminate | MITSUI CHEMICALS, INC. (JP) | 2003-04-10 | — | — | US | disclosed |
| US-20020023565-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2002-02-28 | — | — | US | disclosed |
| US-5965319-A | COMPRISES A AN ONIUM SALT COMPOUND E.G. DIAZONIUM SULFONATE, A CROSSLINKING AGENT CROSSLINKABLE BY AN ACID, A POLYMER COMPOUND HAVING AN ALKALINE-SOLUBLE GROUP, AND AN INFRARED RAY ABSORBING AGENT; LITHOGRAPHY; FORM PLATES; STORAGE STABILITY; | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-12 | — | — | US | disclosed |
| EP-0589309-A1 | Positive-working presensitized plate for use in making lithographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 1994-03-30 | — | — | EP | disclosed |