Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL2381067 | 0.95 | TSHR (1.00) | — | |
| Sulfuric Acid SCHEMBL27312 | 0.95 | — | — | |
| Sulfuric Acid SCHEMBL27823566 | 0.95 | TSHR (1.00) | — | |
| Sulfuric Acid SCHEMBL5267107 | 0.90 | TSHR (0.90) | — | |
| Sulfuric Acid SCHEMBL11324054 | 0.90 | TSHR (0.90) | — | |
| Sulfuric Acid SCHEMBL4533746 | 0.90 | — | — | |
| Sulfuric Acid SCHEMBL2468107 | 0.90 | TSHR (0.90) | — | |
| Sulfuric Acid SCHEMBL11775382 | 0.90 | — | — | |
| Sulfuric Acid SCHEMBL22664671 | 0.90 | — | — | |
| Sulfuric Acid SCHEMBL5284388 | 0.90 | TSHR (0.90) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115386305-A | Environment-friendly modified bentonite inorganic gel and modification method | 句容康泰膨润土有限公司 | 2022-11-25 | — | — | CN | claimed |
| CN-115386305-A | Environment-friendly modified bentonite inorganic gel and modification method | 句容康泰膨润土有限公司 | 2022-11-25 | — | — | CN | disclosed |
| US-7851070-B2 | Diffusion barrier alloy film and high-temperature apparatus member | NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (JP) | 2010-12-14 | — | — | US | disclosed |
| US-20080081214-A1 | Diffusion Barrier Alloy Film, Method Of Manufacturing The Same, And High-Temperature Apparatus Member | NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1715081-A1 | ALLOY COATING FOR DIFFUSION BARRIER, METHOD FOR FORMING SAME, AND HIGH-TEMPERATURE DEVICE MEMBER | EBARA CORPORATION (JP) | 2006-10-25 | — | — | EP | disclosed |