SCHEMBL37690

SCHEMBL37690

CC(C)=C(C)CN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20888882 0.82
SCHEMBL29780244 0.78 MGAM (0.40)
SCHEMBL21548054 0.72
SCHEMBL29042190 0.72
SCHEMBL5180605 0.72
SCHEMBL3861607 0.72
SCHEMBL24072325 0.69
SCHEMBL13865171 0.69
SCHEMBL26468 0.67
SCHEMBL19249466 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 433 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108369907-B Liquid composition and method for surface treatment of semiconductor substrate using same 三菱瓦斯化学株式会社 2022-09-20 CN claimed
CN-108148394-B Storage-stable one-component polyurethane prepregs from polyurethane compositions and moldings produced therefrom 赢创运营有限公司 2021-12-28 CN claimed
US-11094526-B2 Liquid composition for imparting alcohol-repellency to semiconductor substrate material, and method for treating surface of semiconductor substrate using said liquid composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-08-17 US claimed
EP-3404700-B1 LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2020-05-13 EP claimed
US-20190019672-A1 LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2019-01-17 US claimed
EP-3404700-A1 LIQUID COMPOSITION FOR IMPARTING ALCOHOL-REPELLENCY TO SEMICONDUCTOR SUBSTRATE MATERIAL, AND METHOD FOR TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAID LIQUID COMPOSITION Mitsubishi Gas Chemical Company, Inc. (JP) 2018-11-21 EP claimed
CN-108369907-A Liquid composition for imparting alcohol repellency to semiconductor substrate material and method for surface treatment of semiconductor substrate using the same 三菱瓦斯化学株式会社 2018-08-03 CN claimed
US-12590067-B2 Herbicidal cyclohexanedione derivatives SYNGENTA CROP PROTECTION AG (CH) 2026-03-31 US disclosed
US-12479804-B2 Herbicidal compounds SYNGENTA CROP PROTECTION AG (CH) 2025-11-25 US disclosed
EP-4429460-B1 SURFACTANT COMBINATION FOR AQUEOUS AGROCHEMICAL (CROP PROTECTION) SUSPENSION FORMULATIONS WITH HIGH SALT CONTENT AND LOW-CONCENTRATION OF SULFONYLUREA HERBICIDE BAYER AG (DE) 2025-10-15 EP disclosed
EP-3999492-B1 HERBICIDAL COMPOUNDS SYNGENTA CROP PROTECTION AG (CH) 2025-09-03 EP disclosed
US-12398101-B2 Herbicidal 2-azaspiro[3-5]nonane compounds SYNGENTA CROP PROTECTION AG (CH) 2025-08-26 US disclosed
EP-3586633-B1 PESTICIDAL MIXTURES INCLUDING SPIROHETEROCYCLIC PYRROLIDINE DIONES SYNGENTA CROP PROTECTION AG (CH) 2025-06-18 EP disclosed
US-5205854-A Herbicides BASF AKTIENGESELLSCHAFT (DE) 1993-04-27 US disclosed
US-5203907-A Herbicides BASF AKTIENGESELLSCHAFT (DE) 1993-04-20 US disclosed
US-5080708-A Herbicides BASF AKTIENGESELLSCHAFT (DE) 1992-01-14 US disclosed
US-4073066-A Methylene chloride phosphatizing DIAMOND SHAMROCK CORPORATION (US) 1978-02-14 US disclosed
US-4070521-A TRACE ELEMENTS, IRON, PHOSPHORUS, OXYGEN, CARBON, NITROGEN DIAMOND SHAMROCK CORPORATION (US) 1978-01-24 US disclosed
US-4056409-A METHYLENE CHLORIDE, WATER, ALCOHOL, PHOSPHORIC ACID DIAMOND SHAMROCK CORPORATION (US) 1977-11-01 US disclosed
US-4008101-A PHOSPHORIC ACID DIAMOND SHAMROCK CORPORATION (US) 1977-02-15 US disclosed