⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11445948 | 0.79 | — | — | |
| SCHEMBL6948996 | 0.76 | — | — | |
| SCHEMBL31288501 | 0.70 | — | — | |
| SCHEMBL283448 | 0.68 | — | — | |
| SCHEMBL3781138 | 0.64 | — | — | |
| SCHEMBL4903181 | 0.64 | — | — | |
| SCHEMBL4626970 | 0.61 | — | — | |
| SCHEMBL21957843 | 0.60 | — | — | |
| SCHEMBL11864589 | 0.59 | — | — | |
| SCHEMBL26061579 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120059171-A | Preparation method, powder product and application of high molecular weight heterocyclic aromatic polyamide powder | 中蓝晨光化工研究设计院有限公司 | 2025-05-30 | — | — | CN | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| EP-1560070-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |
| US-4368335-A | N'-(2,6-Dichloro-4-(substituted-benzylamino)phenyl)-N,N-dimethyl-formamidines | AMERICAN CYANAMID COMPANY (US) | 1983-01-11 | — | — | US | disclosed |
| US-4360466-A | N'-[2,6-Dichloro-4-(substituted-benzylideneamino)phenyl]-N,N-dimethylformamidines | AMERICAN CYANAMID COMPANY (US) | 1982-11-23 | — | — | US | disclosed |
| US-4053446-A | PROCESS FOR PREPARING HIGH TEAR-STRENGTH POLYDIENE POLYURETHANE | BRIDGESTONE TIRE COMPANY, LTD. (JA) | 1977-10-11 | — | — | US | disclosed |