Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRNP | P04156 | 1/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.48 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.48 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | PARP1 | P09874 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | TYMS | P04818 | 1/20 | 0.43 |
| ▸ | CDC25B | P30305 | 1/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | WDR5 | P61964 | 1/20 | 0.41 |
| ▸ | LDHA | P00338 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | FABP4 | P15090 | 1/20 | 0.39 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31337530 | 1.00 | PRNP (0.56) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL11679114 | 0.92 | PRNP (0.56) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL29531845 | 0.90 | PRNP (0.54) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL17982451 | 0.90 | PRNP (0.54) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL1133960 | 0.90 | PRNP (0.47) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL29195206 | 0.89 | HSD17B10 (0.53) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL4260223 | 0.87 | CYP1A2 (0.50) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL2830679 | 0.83 | NR4A1 (0.61) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL31401789 | 0.83 | NR4A1 (0.61) | PRNPCYP1A2NR4A1NR4A2NR4A3 | |
| SCHEMBL29904701 | 0.83 | NR4A1 (0.61) | PRNPCYP1A2NR4A1NR4A2NR4A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4033986-A | Process for the preparation of 4-bromo-1,8-naphthalic acid anhydride | AMERICAN HOECHST CORPORATION (US) | 1977-07-05 | — | — | US | claimed |
| CN-106478505-A | A kind of two-photon GSH probe and its preparation and application | 浙江工业大学 | 2017-03-08 | — | — | CN | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| EP-1560070-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2009-12-30 | — | — | EP | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1206456-B1 | THERMOCHROMIC RYLENE DYES | BASF AG (DE) | 2004-11-17 | — | — | EP | disclosed |
| US-20040023159-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-6486319-B1 | Thermochromic rylene dyes | BASF AKTIENGESELLSCHAFT (DE) | 2002-11-26 | — | — | US | disclosed |
| US-6307068-B1 | TREATING OR IN PREVENTING CANCER. | ADIR ET COMPAGNIE (FR) | 2001-10-23 | — | — | US | disclosed |
| EP-0157022-A1 | Process for the preparation of 4-chloro / 4-bromonaphthalic acid anhydrid | RÜTGERSWERKE AKTIENGESELLSCHAFT (DE) | 1985-10-09 | — | — | EP | disclosed |
| US-4212813-A | OXIDIZING ACENAPHTHENES, COBALT COMPOUND CATALYST | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1980-07-15 | — | — | US | disclosed |
| US-3987003-A | THERMALLY STABLE DIOXO AND DITHIO-BENZISOQUINOLINE COMPOSITIONS AND PROCESS OF SYNTHESIZING SAME | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) | 1976-10-19 | — | — | US | disclosed |
| US-3954810-A | Process for the preparation of 4-bromonaphthalic acid anhydride | HOECHST AKTIENGESELLSCHAFT (DT) | 1976-05-04 | — | — | US | disclosed |