⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15360335 | 0.81 | — | — | |
| SCHEMBL22200161 | 0.77 | — | — | |
| SCHEMBL31722718 | 0.77 | — | — | |
| SCHEMBL15360691 | 0.75 | — | — | |
| SCHEMBL31722443 | 0.72 | — | — | |
| SCHEMBL15186188 | 0.69 | — | — | |
| SCHEMBL2100211 | 0.69 | — | — | |
| SCHEMBL2272907 | 0.69 | — | — | |
| SCHEMBL1525919 | 0.67 | — | — | |
| SCHEMBL31722480 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6365643-B1 | Photoinitiators for cationic curing | TH. GOLDSCHMIDT AG (DE) | 2002-04-02 | — | — | US | claimed |
| US-11965111-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20230136499-A1 | Selective Passivation Of Damaged Nitride | APPLIED MATERIALS, INC. (US) | 2023-05-04 | — | — | US | disclosed |
| US-20230136499-A1 | Selective Passivation Of Damaged Nitride | APPLIED MATERIALS, INC. (US) | 2023-05-04 | — | — | US | disclosed |
| US-10941301-B2 | Surface treatment method, surface treatment agent, and method for forming film region-selectively on substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-09 | — | — | US | disclosed |
| WO-2020127413-A1 | SILICOUS FILM FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING SILICEOUS FILM USING SAME | MERCK PATENT GMBH (DE) | 2020-06-25 | — | — | WO | disclosed |
| US-20200079962-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-12 | — | — | US | disclosed |
| US-20200062968-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-02-27 | — | — | US | disclosed |
| US-20190203054-A1 | SURFACE TREATMENT METHOD, SURFACE TREATMENT AGENT, AND METHOD FOR FORMING FILM REGION-SELECTIVELY ON SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| CN-104909581-B | It is used to form the pre-treating method of the glass substrate of etching mask | 东京应化工业株式会社 | 2019-03-08 | — | — | CN | disclosed |
| EP-1020479-B1 | Photoinitiators for cationic curing | GOLDSCHMIDT GMBH (DE) | 2005-08-10 | — | — | EP | disclosed |
| US-20050044778-A1 | Fuel compositions employing catalyst combustion structure | OCTANE INTERNATIONAL, LTD. | 2005-03-03 | — | — | US | disclosed |
| US-20040237384-A1 | Fuel compositions exhibiting improved fuel stability | OCTANE INTERNATIONAL, LTD. | 2004-12-02 | — | — | US | disclosed |
| US-6652608-B1 | Fuel compositions exhibiting improved fuel stability | OCTANE INTERNATIONAL, LTD. | 2003-11-25 | — | — | US | disclosed |
| US-6365643-B1 | Photoinitiators for cationic curing | TH. GOLDSCHMIDT AG (DE) | 2002-04-02 | — | — | US | disclosed |
| EP-1051461-A2 | FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE | ORR, William C. (US) | 2000-11-15 | — | — | EP | disclosed |
| EP-1020479-A2 | Photoinitiators for cationic curing | Goldschmidt AG (DE) | 2000-07-19 | — | — | EP | disclosed |
| WO-1999066009-A2 | FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE | ORR WILLIAM C (US) | 1999-12-23 | — | — | WO | disclosed |
| EP-0954558-A1 | FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY | ORR, William C. (US) | 1999-11-10 | — | — | EP | disclosed |
| WO-1998026028-A1 | FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY | ORR WILLIAM C (US) | 1998-06-18 | — | — | WO | disclosed |