SCHEMBL3780348

SCHEMBL3780348

[Co].[Ir].[Rh]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL975706 0.82
SCHEMBL8904333 0.82
SCHEMBL8781675 0.82
SCHEMBL33372522 0.82
SCHEMBL1538485 0.82
SCHEMBL442058 0.82
SCHEMBL743245 0.82
SCHEMBL3778453 0.67
SCHEMBL3778824 0.67
SCHEMBL3765329 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220250039-A1 VAPOR PHASE METHANOL CARBONYLATION CATALYST ENERKEM INC. (CA) 2022-08-11 US claimed
CN-114096347-A Gas phase methanol carbonylation catalyst 埃讷肯公司 2022-02-25 CN claimed
US-12383888-B2 Vapor phase methanol carbonylation catalyst ENERKEM INC. (CA) 2025-08-12 US disclosed
US-20220250039-A1 VAPOR PHASE METHANOL CARBONYLATION CATALYST ENERKEM INC. (CA) 2022-08-11 US disclosed
CN-114096347-A Gas phase methanol carbonylation catalyst 埃讷肯公司 2022-02-25 CN disclosed
WO-2020237350-A1 VAPOR PHASE METHANOL CARBONYLATION CATALYST ENERKEM INC. (CA) 2020-12-03 WO disclosed
US-7855021-B2 atomic layer deposition; platinum alloys; fuel cells BROOKHAVEN SCIENCE ASSOCIATES, LLC (US) 2010-12-21 US disclosed
US-7279231-B2 Electroless plating structure INTEL CORPORATION (US) 2007-10-09 US disclosed
US-20070031722-A1 Electrocatalysts having platinum monolayers on palladium, palladium alloy, and gold alloy nanoparticle cores, and uses thereof UNITED STATES DEPARTMENT OF ENERGY 2007-02-08 US disclosed
US-6908504-B2 Electroless plating bath composition and method of using INTEL CORPORATION (US) 2005-06-21 US disclosed
US-20040038073-A1 Electroless plating bath composition and method of using CHEBIAM RAMANAN V (US) 2004-02-26 US disclosed
US-20040035316-A1 Electroless plating bath composition and method of using CHEBIAM RAMANAN V (US) 2004-02-26 US disclosed
US-6645567-B2 Cobalt electroless plating bath composition and method of using it for microelectronic device fabrication. In one embodiment, the present invention relates to cobalt electroless plating in the fabrication of interconnect INTEL CORPORATION 2003-11-11 US disclosed
US-20030113576-A1 Electroless plating bath composition and method of using INTEL CORPORATION 2003-06-19 US disclosed