Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL816280 | 0.84 | CA1 (0.31) | — | |
| SCHEMBL3789142 | 0.75 | — | — | |
| SCHEMBL15661622 | 0.70 | — | — | |
| SCHEMBL17950865 | 0.69 | — | — | |
| SCHEMBL2559399 | 0.69 | — | — | |
| SCHEMBL3154961 | 0.69 | — | — | |
| SCHEMBL21517776 | 0.69 | — | — | |
| SCHEMBL604452 | 0.69 | — | — | |
| SCHEMBL28881772 | 0.69 | PTGS1 (0.30) | — | |
| SCHEMBL23250812 | 0.68 | BTN3A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7858288-B2 | Positive resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-20080268376-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-30 | — | — | US | disclosed |